公开(公告)号：US08578313B2

公开(公告)日：2013-11-05

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。

公开(公告)号：US20090271749A1

公开(公告)日：2009-10-29

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。

公开(公告)号：US08566754B2

公开(公告)日：2013-10-22

申请号：US12275887

申请日：2008-11-21

申请人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

发明人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that automatically processes manufacturing hotspot information. During operation, the system receives a pattern clip associated with a manufacturing hotspot in a layout, wherein the pattern clip comprises a set of polygons in proximity to the manufacturing hotspot's location. Next, the system determines if the pattern clip matches a known manufacturing hotspot configuration. If the pattern clip does not match a known manufacturing hotspot configuration, the system then performs a perturbation process on the pattern clip to determine a set of correction recommendations to eliminate the manufacturing hotspot. By performing the perturbation process, the system additionally determines ranges of perturbation to the set of polygons wherein the perturbed pattern clip does not eliminate the manufacturing hotspot. Subsequently, the system stores the set of correction recommendations and the ranges of perturbation into a manufacturing hotspot database.

摘要翻译： 本发明的一个实施例提供一种自动处理制造热点信息的系统。 在操作期间，系统接收与布局中的制造热点相关联的图案剪辑，其中图案剪辑包括靠近制造热点位置的一组多边形。 接下来，系统确定模式剪辑是否匹配已知的制造热点配置。 如果图案剪辑与已知的制造热点配置不匹配，则系统然后对图案剪辑执行扰动处理，以确定一组校正建议以消除制造热点。 通过执行扰动过程，系统另外确定对该组多边形的扰动范围，其中扰动图案片不消除制造热点。 随后，系统将修正建议的集合和扰动范围存储到制造热点数据库中。

公开(公告)号：US20090268958A1

公开(公告)日：2009-10-29

申请号：US12275887

申请日：2008-11-21

申请人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

发明人： Kent Y. Kwang ,  Daniel Zhang ,  Zongwu Tang ,  Subarnarekha Sinha

IPC分类号： G06K9/00

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that automatically processes manufacturing hotspot information. During operation, the system receives a pattern clip associated with a manufacturing hotspot in a layout, wherein the pattern clip comprises a set of polygons in proximity to the manufacturing hotspot's location. Next, the system determines if the pattern clip matches a known manufacturing hotspot configuration. If the pattern clip does not match a known manufacturing hotspot configuration, the system then performs a perturbation process on the pattern clip to determine a set of correction recommendations to eliminate the manufacturing hotspot. By performing the perturbation process, the system additionally determines ranges of perturbation to the set of polygons wherein the perturbed pattern clip does not eliminate the manufacturing hotspot. Subsequently, the system stores the set of correction recommendations and the ranges of perturbation into a manufacturing hotspot database.

摘要翻译： 本发明的一个实施例提供一种自动处理制造热点信息的系统。 在操作期间，系统接收与布局中的制造热点相关联的图案剪辑，其中图案剪辑包括靠近制造热点位置的一组多边形。 接下来，系统确定模式剪辑是否匹配已知的制造热点配置。 如果图案剪辑与已知的制造热点配置不匹配，则系统然后对图案剪辑执行扰动处理，以确定一组校正建议以消除制造热点。 通过执行扰动过程，系统另外确定对该组多边形的扰动范围，其中扰动图案片不消除制造热点。 随后，系统将修正建议的集合和扰动范围存储到制造热点数据库中。

公开(公告)号：US20090300561A1

公开(公告)日：2009-12-03

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08037428B2

公开(公告)日：2011-10-11

申请号：US12129617

申请日：2008-05-29

申请人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

发明人： Yang-Shan Tong ,  Daniel Zhang ,  Linni Wei ,  Alex Miloslavsky ,  Wei-Chih Tseng ,  Zongwu Tang

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that verifies an integrated circuit (IC) chip layout. During operation, the system receives a layout of an IC chip after the layout has gone through a place-and-route operation. Next, the system performs a lithography compliance checking (LCC) operation on the layout to detect lithography hotspots within the layout, wherein each lithography hotspot is associated with a local routing pattern around the lithography hotspot. Next, for each detected lithography hotspot, the system compares the associated local routing pattern against a hotspot database to determine if the local routing pattern matches an entry in the hotspot database, which stores a set of known hotspot configurations. If so, the system corrects the lithography hotspot using correction guidance information associated with the hotspot configuration stored in the hotspot database. Otherwise, the system corrects the lithography hotspot by performing a local rip-up and reroute on the local routing pattern, iteratively, until achieving convergence or given number of iterations.

摘要翻译： 本发明的一个实施例提供一种验证集成电路（IC）芯片布局的系统。 在操作过程中，系统在布局经过布线操作后接收IC芯片的布局。 接下来，系统在布局上执行光刻柔性检查（LCC）操作以检测布局内的光刻热点，其中每个光刻热点与光刻热点周围的局部布线图案相关联。 接下来，对于每个检测到的光刻热点，系统将相关联的本地路由模式与热点数据库进行比较，以确定本地路由模式是否匹配热点数据库中存储一组已知热点配置的条目。 如果是，则系统使用与存储在热点数据库中的热点配置相关联的校正指导信息来校正光刻热点。 否则，系统通过对本地路由模式执行局部的rip-up和重新路由来迭代地校正光刻热点，直到达到收敛或给定的迭代次数。

公开(公告)号：US08458635B2

公开(公告)日：2013-06-04

申请号：US12631167

申请日：2009-12-04

申请人： Min Ni ,  Zongwu Tang ,  Qing Su

发明人： Min Ni ,  Zongwu Tang ,  Qing Su

IPC分类号： G06F17/50

CPC分类号： G06F17/5072 ,  G06F17/50 ,  G06F2217/68

摘要： A convolution of the kernel over a layout in a multi-core processor system includes identifying a sector, called a dynamic band, of the layout including a plurality of evaluation points. Layout data specifying the sector of the layout is loaded in shared memory, which is shared by a plurality of processor cores. A convolution operation of the kernel and the evaluation points in the sector is executed. The convolution operation includes iteratively loading parts of the basis data set, called a stride, into space available in shared memory given the size of the layout data specifying the sector. A plurality of threads is executed concurrently using the layout data for the sector and the currently loaded part of the basis data set. The iteration for the loading basis data set proceeds through the entire data set until the convolution operation is completed.

摘要翻译： 内核在多核处理器系统中的布局的卷积包括识别包括多个评估点的布局的称为动态带的扇区。 指定布局扇区的布局数据被加载到由多个处理器核共享的共享存储器中。 执行内核和扇区中评估点的卷积运算。 卷积操作包括在给定指定扇区的布局数据的大小的情况下，将称为步幅的基础数据集的部分迭代地加载到共享存储器中可用的空间中。 使用用于扇区的布局数据和基础数据集的当前加载的部分来同时执行多个线程。 加载基础数据集的迭代通过整个数据集进行，直到卷积操作完成。

公开(公告)号：US20110138157A1

公开(公告)日：2011-06-09

申请号：US12631167

申请日：2009-12-04

申请人： MIN NI ,  Zongwu Tang ,  Qing Su

发明人： MIN NI ,  Zongwu Tang ,  Qing Su

IPC分类号： G06F12/02 ,  G06F9/312

CPC分类号： G06F17/5072 ,  G06F17/50 ,  G06F2217/68

摘要： A convolution of the kernel over a layout in a multi-core processor system includes identifying a sector, called a dynamic band, of the layout including a plurality of evaluation points. Layout data specifying the sector of the layout is loaded in shared memory, which is shared by a plurality of processor cores. A convolution operation of the kernel and the evaluation points in the sector is executed. The convolution operation includes iteratively loading parts of the basis data set, called a stride, into space available in shared memory given the size of the layout data specifying the sector. A plurality of threads is executed concurrently using the layout data for the sector and the currently loaded part of the basis data set. The iteration for the loading basis data set proceeds through the entire data set until the convolution operation is completed.

摘要翻译： 内核在多核处理器系统中的布局的卷积包括识别包括多个评估点的布局的称为动态带的扇区。 指定布局扇区的布局数据被加载到由多个处理器核共享的共享存储器中。 执行内核和扇区中评估点的卷积运算。 卷积操作包括在给定指定扇区的布局数据的大小的情况下，将称为步幅的基础数据集的部分迭代地加载到共享存储器中可用的空间中。 使用用于扇区的布局数据和基础数据集的当前加载的部分来同时执行多个线程。 加载基础数据集的迭代通过整个数据集进行，直到卷积操作完成。

公开(公告)号：US20110095367A1

公开(公告)日：2011-04-28

申请号：US12605102

申请日：2009-10-23

申请人： Qing Su ,  Min Ni ,  Zongwu Tang ,  Jamil Kawa ,  James D. Sproch

发明人： Qing Su ,  Min Ni ,  Zongwu Tang ,  Jamil Kawa ,  James D. Sproch

IPC分类号： H01L27/06 ,  G06F17/50 ,  H01L21/336

CPC分类号： G06F17/5068 ,  H01L23/481 ,  H01L23/60 ,  H01L23/62 ,  H01L27/0207 ,  H01L27/0255 ,  H01L2225/06541 ,  H01L2924/0002 ,  H01L2924/00012 ,  H01L2924/00

摘要： Roughly described, an antenna diode is formed at least partially within the exclusion zone around a TSV, and is connected to the TSV by way of a metal 1 layer conductor at the same time that the TSV is connected to either the gate poly or a diffusion region of one or more transistors placed outside the exclusion zone.

摘要翻译： 粗略地描述，天线二极管至少部分地形成在TSV周围的排阻区内，并且通过金属1层导体连接到TSV，同时TSV连接到栅极多晶硅或扩散层 放置在排除区外的一个或多个晶体管的区域。

公开(公告)号：US20070055953A1

公开(公告)日：2007-03-08

申请号：US11510415

申请日：2006-08-25

申请人： Weiping Fang ,  Huijuan Zhang ,  Yibing Wang ,  Zongwu Tang

发明人： Weiping Fang ,  Huijuan Zhang ,  Yibing Wang ,  Zongwu Tang

IPC分类号： G06F17/50 ,  G06K9/00

CPC分类号： G03F1/36 ,  G03F1/68

摘要： A system that verifies a simulated wafer image against an intended design. During operation, the system receives a design. Next, the system generates a skeleton from the design, wherein the skeleton specifies cell placements and associated bounding boxes for the cell placements, but does not include geometries for the cell placements. The system then computes environments for cell placements based on the skeleton. Next, the system generates templates for cell placements, wherein a template for a cell placement specifies the cell placement and the environment surrounding the cell placement. The system then generates the simulated wafer image by performing model-based simulations for cell placements associated with unique templates.

摘要翻译： 根据预期设计验证模拟晶片图像的系统。 在运行过程中，系统接收到一个设计。 接下来，系统从设计生成骨架，其中骨架指定单元格展示位置的单元格展示位置和相关联的边界框，但不包括单元格展示位置的几何。 然后系统基于骨架计算单元格展示位置的环境。 接下来，系统生成单元格展示位置的模板，其中单元格展示位置的模板指定单元格展示位置和单元格展示位置周围的环境。 然后，系统通过对与唯一模板相关联的单元格展示执行基于模型的模拟来生成模拟的晶片图像。