公开(公告)号：US08578313B2

公开(公告)日：2013-11-05

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。

公开(公告)号：US20090271749A1

公开(公告)日：2009-10-29

申请号：US12109118

申请日：2008-04-24

申请人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

发明人： Zongwu Tang ,  Daniel Zhang ,  Alex Miloslavsky ,  Subarnarekha Sinha ,  Jingyu Xu ,  Kent Y. Kwang ,  Kevin A. Beaudette

IPC分类号： G06F17/50

CPC分类号： G06F17/5081 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the present invention provides a system that generates a pattern-clip-based hotspot database for performing automatic pattern-clip-based layout verification. During operation, the system receives a list of pattern clips which specify manufacturing hotspots to be avoided in a layout, wherein each pattern clip comprises a set of geometries in proximity to each other. Next, for each pattern clip, the system perturbs the pattern clip to determine a first range of variations for the constituent set of geometries wherein the perturbed pattern clip no longer causes a manufacturing hotspot. The system then extracts a set of correction guidance descriptions from the first range of variations for correcting the pattern clip. Subsequently, the system stores the pattern clip and the set of correction guidance descriptions in the pattern-clip-based hotspot database.

摘要翻译： 本发明的一个实施例提供了一种生成用于执行基于模式片段的自动布局验证的基于模式片段的热点数据库的系统。 在操作期间，系统接收指定要在布局中避免的制造热点的图案片段的列表，其中每个图案剪辑包括彼此靠近的一组几何图形。 接下来，对于每个图案剪辑，系统扰乱图案剪辑以确定组件几何形状的第一变化范围，其中扰动的图案剪辑不再导致制造热点。 然后，系统从用于校正图案剪辑的第一变化范围中提取一组校正指导描述。 随后，系统将模式剪辑和一组校正指导描述存储在基于模式片段的热点数据库中。

公开(公告)号：US06823503B2

公开(公告)日：2004-11-23

申请号：US10334566

申请日：2002-12-31

申请人： Kevin A. Beaudette

发明人： Kevin A. Beaudette

IPC分类号： G06F1750

CPC分类号： G06F17/5068 ,  G03F1/26 ,  G06F2217/12 ,  Y02P90/265

摘要： One embodiment of the invention provides a system that creates a phase-shifting mask for a photolithographic process used in fabricating an integrated circuit. The system starts by receiving a layout for the integrated circuit. The system then associates nodes with features in the layout, and generates arcs between the nodes. Next, the system generates a coloring for the nodes using two colors. The system then generates phase shifters for the phase-shifting mask and assigns different phases to the phase shifters based upon the coloring of the nodes.