Invention Grant
US08581206B2 Focused ion beam system and sample processing method using the same 有权
聚焦离子束系统和样品处理方法使用相同

Focused ion beam system and sample processing method using the same
Abstract:
A focused ion beam system includes a sample holder having a fixing plane for fixing a sample, a sample base on which the sample holder is provided, a focused ion beam irradiating mechanism that irradiates a focused ion beam to the sample, microtweezers that hold the sample and have the axial direction at a predetermined angle to a surface of the sample base, an opening/closing mechanism that opens and closes the microtweezers, a rotating mechanism that rotates the microtweezers about the axial direction, and a moving mechanism that moves the position of the microtweezers.
Information query
Patent Agency Ranking
0/0