Invention Grant
US08598544B2 Method of generating a two-level pattern for lithographic processing and pattern generator using the same
有权
用于生成用于光刻处理的二级图案的方法和使用其的图案生成器
- Patent Title: Method of generating a two-level pattern for lithographic processing and pattern generator using the same
- Patent Title (中): 用于生成用于光刻处理的二级图案的方法和使用其的图案生成器
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Application No.: US13293370Application Date: 2011-11-10
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Publication No.: US08598544B2Publication Date: 2013-12-03
- Inventor: Teunis Van De Peut , Marco Jan-Jaco Wieland
- Applicant: Teunis Van De Peut , Marco Jan-Jaco Wieland
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Hoyng Monegier LLP
- Agent David P. Owen; Coraline J. Haitjema
- Main IPC: H01J37/06
- IPC: H01J37/06 ; H01J37/07 ; G21K5/10
Abstract:
The invention relates to a method of generating a two-level pattern for lithographic processing by multiple beamlets. In the method, first a pattern in vector format is provided. The vector format pattern is then converted into a pattern in pixmap format. Finally, a two-level pattern is formed by application of error diffusion on the pixmap format pattern.
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