Invention Grant
- Patent Title: Vapor deposition method, vapor deposition device and organic EL display device
- Patent Title (中): 蒸镀法,蒸镀装置以及有机EL显示装置
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Application No.: US13824859Application Date: 2011-10-11
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Publication No.: US08609442B2Publication Date: 2013-12-17
- Inventor: Satoshi Inoue , Shinichi Kawato , Tohru Sonoda
- Applicant: Satoshi Inoue , Shinichi Kawato , Tohru Sonoda
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Morrison & Foerster LLP
- Priority: JP2010-243646 20101029
- International Application: PCT/JP2011/073341 WO 20111011
- International Announcement: WO2012/056877 WO 20120503
- Main IPC: H01L21/00
- IPC: H01L21/00 ; G01R31/26 ; H01L29/08 ; H01L23/58 ; C23C16/00 ; B05C11/00

Abstract:
A coating film (90) is formed by causing vapor deposition particles (91) discharged from a vapor deposition source opening (61) of a vapor deposition source (60) to pass through a space between a plurality of control plates (81) of a control plate unit (80) and a mask opening (71) of a vapor deposition mask in this order and adhere to a substrate, while the substrate (10) is moved relative to the vapor deposition mask (70) in a state in which the substrate (10) and the vapor deposition mask (70) are spaced apart at a fixed interval. A difference in the amount of thermal expansion between the vapor deposition source and the control plate unit is detected and corrected. It is thereby possible to form, at a desired position on a large-sized substrate, the coating film in which edge blur and variations in the edge blur are suppressed.
Public/Granted literature
- US20130196454A1 VAPOR DEPOSITION METHOD, VAPOR DEPOSITION DEVICE AND ORGANIC EL DISPLAY DEVICE Public/Granted day:2013-08-01
Information query
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