发明授权
US08610276B2 Metal cap for back end of line (BEOL) interconnects, design structure and method of manufacture
有权
后端金属盖（BEOL）互连，设计结构和制造方法
- 专利标题： Metal cap for back end of line (BEOL) interconnects, design structure and method of manufacture
- 专利标题（中）： 后端金属盖（BEOL）互连，设计结构和制造方法
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申请号： US13474916申请日： 2012-05-18
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公开(公告)号： US08610276B2公开(公告)日： 2013-12-17
- 发明人: Chih-Chao Yang , Kaushik Chanda , Daniel C. Edelstein
- 申请人： Chih-Chao Yang , Kaushik Chanda , Daniel C. Edelstein
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Roberts Mlotkowski Safran & Cole, P.C.
- 代理商 Katherine S. Brown
- 主分类号： H01L23/48
- IPC分类号： H01L23/48
摘要：
A structure is provided with a metal cap for back end of line (BEOL) interconnects that substantially eliminates electro-migration (EM) damage, a design structure and a method of manufacturing the IC. The structure includes a metal interconnect formed in a dielectric material and a metal cap selective to the metal interconnect. The metal cap includes RuX, where X is at Boron, Phosphorous or a combination of Boron and Phosphorous.
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