发明授权
- 专利标题: Interferometric surface inspection using a slit-shaped reference beam from inspection surface
- 专利标题(中): 使用来自检查表面的狭缝状参考光束进行干涉测试
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申请号: US12926622申请日: 2010-11-30
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公开(公告)号: US08643845B2公开(公告)日: 2014-02-04
- 发明人: Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
- 申请人: Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
- 申请人地址: KR Yongin, Gyeonggi-Do
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR Yongin, Gyeonggi-Do
- 代理机构: Lee & Morse, P.C.
- 优先权: KR10-2009-0117891 20091201
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01B11/02
摘要:
Provided are a surface inspection apparatus and method capable of detecting foreign materials on the surface of a substrate, and a slit coater having the surface inspection apparatus. In the surface inspection apparatus, a slit lighting unit irradiates slit-shaped light. An optical system splits the slit-shaped light into two beams traveling along two different paths, is incident upon a subject, and extracts an interference image caused by combination of the two beams reflected from the subject. An imaging device captures the interference image to output an image signal. An analysis unit acquires a luminance value of the image signal, analyzes the luminance value in real time, and determines whether or not foreign materials are present.
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