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1.发明申请公开(公告)号：US20110128550A1
公开(公告)日：2011-06-02
申请号：US12926622
申请日：2010-11-30
申请人： Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
发明人： Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
CPC分类号： G01N21/94 , G01N21/8901 , G01N21/9501
摘要： Provided are a surface inspection apparatus and method capable of detecting foreign materials on the surface of a substrate, and a slit coater having the surface inspection apparatus. In the surface inspection apparatus, a slit lighting unit irradiates slit-shaped light. An optical system splits the slit-shaped light into two beams traveling along two different paths, is incident upon a subject, and extracts an interference image caused by combination of the two beams reflected from the subject. An imaging device captures the interference image to output an image signal. An analysis unit acquires a luminance value of the image signal, analyzes the luminance value in real time, and determines whether or not foreign materials are present.
摘要翻译： 提供了能够检测基板表面的异物的表面检查装置和方法，以及具有表面检查装置的狭缝涂布机。 在表面检查装置中，狭缝照明部照射狭缝状的光。 光学系统将狭缝状光分成沿着两个不同路径行进的两束光束，入射到被摄体上，并提取由对象反射的两束光的组合引起的干涉图像。 成像装置捕获干涉图像以输出图像信号。 分析单元获取图像信号的亮度值，实时分析亮度值，并确定是否存在异物。
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2.发明授权Interferometric surface inspection using a slit-shaped reference beam from inspection surface 有权使用来自检查表面的狭缝状参考光束进行干涉测试公开(公告)号：US08643845B2
公开(公告)日：2014-02-04
申请号：US12926622
申请日：2010-11-30
申请人： Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
发明人： Eui-Shin Shin , Myeng Woo Nam , Jin-Han Park , Jae-Seok Park
CPC分类号： G01N21/94 , G01N21/8901 , G01N21/9501
摘要： Provided are a surface inspection apparatus and method capable of detecting foreign materials on the surface of a substrate, and a slit coater having the surface inspection apparatus. In the surface inspection apparatus, a slit lighting unit irradiates slit-shaped light. An optical system splits the slit-shaped light into two beams traveling along two different paths, is incident upon a subject, and extracts an interference image caused by combination of the two beams reflected from the subject. An imaging device captures the interference image to output an image signal. An analysis unit acquires a luminance value of the image signal, analyzes the luminance value in real time, and determines whether or not foreign materials are present.
摘要翻译： 提供了能够检测基板表面的异物的表面检查装置和方法，以及具有表面检查装置的狭缝涂布机。 在表面检查装置中，狭缝照明部照射狭缝状的光。 光学系统将狭缝状光分成沿着两个不同路径行进的两束光束，入射到被摄体上，并提取由对象反射的两束光的组合引起的干涉图像。 成像装置捕获干涉图像以输出图像信号。 分析单元获取图像信号的亮度值，实时分析亮度值，并确定是否存在异物。
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3.发明申请Coating apparatus, coating method thereof, and method of forming organic layer using the same 审中-公开涂布装置及其涂布方法以及使用其形成有机层的方法公开(公告)号：US20110097499A1
公开(公告)日：2011-04-28
申请号：US12659060
申请日：2010-02-24
申请人： Jin-Han Park , Myeng-Woo Nam , Eui-Shin Shin , Sung-Gon Kim
发明人： Jin-Han Park , Myeng-Woo Nam , Eui-Shin Shin , Sung-Gon Kim
CPC分类号： H01L51/0026 , H01L21/67115 , H01L21/6715 , H01L51/0008 , H01L51/56
摘要： A coating apparatus includes a stage supporting a coating target, a coating part on the stage, the coating part being configured to apply a coating material onto the coating target, and a heating source opposite to and spaced apart from the stage, the heating source being configured to supply heat to the coating target after application of the coating material onto the coating target.
摘要翻译： 一种涂布装置，包括：支撑涂布目标的载物台;载物台上的涂布部;涂布部，被配置为在涂布目标上涂布涂料;以及加热源，与所述载物台相对且间隔开，所述加热源为 被配置为在将涂覆材料施加到涂覆靶上之后向涂覆目标提供热量。
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公开(公告)号：US09406885B2
公开(公告)日：2016-08-02
申请号：US13961111
申请日：2013-08-07
申请人： Jin-Han Park , Myeng-Woo Nam , Eui-Shin Shin , Sung-Gon Kim
发明人： Jin-Han Park , Myeng-Woo Nam , Eui-Shin Shin , Sung-Gon Kim
CPC分类号： H01L51/0026 , H01L21/67115 , H01L21/6715 , H01L51/0008 , H01L51/56
摘要： A coating apparatus includes a stage supporting a coating target, a coating part on the stage, the coating part being configured to apply a coating material onto the coating target, and a heating source opposite to and spaced apart from the stage, the heating source being configured to supply heat to the coating target after application of the coating material onto the coating target.
摘要翻译： 一种涂布装置，包括：支撑涂布目标的载物台;载物台上的涂布部;涂布部，被配置为在涂布目标上涂布涂料;以及加热源，与所述载物台相对且间隔开，所述加热源为 被配置为在将涂覆材料施加到涂覆靶上之后向涂覆目标提供热量。
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5.发明授权Mask frame assembly for thin film deposition and the manufacturing method thereof 有权用于薄膜沉积的面罩框架组件及其制造方法公开(公告)号：US08869738B2
公开(公告)日：2014-10-28
申请号：US13244100
申请日：2011-09-23
申请人： Eui-Shin Shin , Jae-Seok Park , Young-Geun Cho , Woo-Dong Kim , Kyu-Bum Kim , Jeung-Woo Huh
发明人： Eui-Shin Shin , Jae-Seok Park , Young-Geun Cho , Woo-Dong Kim , Kyu-Bum Kim , Jeung-Woo Huh
CPC分类号： G03F1/00 , C23C14/042 , H01L51/0011 , Y10T29/49826 , Y10T156/10
摘要： A mask frame assembly using a plurality of stick-shaped split masks. The mask frame assembly includes a plurality of split masks, each of which includes a deposition pattern corresponding to a unit screen. Each of the split masks is formed of a plurality of partial masks to form the deposition pattern corresponding to a unit screen. Accordingly, the split masks accommodating a pattern corresponding to a large screen may be easily manufactured without an increase in the amount of etching errors.
摘要翻译： 一种使用多个棒状分割掩模的面罩框架组件。 掩模框架组件包括多个分割掩模，每个分离掩模包括对应于单位屏幕的沉积图案。 每个分割掩模由多个部分掩模形成，以形成对应于单位屏幕的沉积图案。 因此，可以容易地制造适合与大屏幕相对应的图案的分割掩模，而不增加蚀刻误差量。
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6.发明授权公开(公告)号：US09259805B2
公开(公告)日：2016-02-16
申请号：US12964706
申请日：2010-12-09
申请人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
发明人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
CPC分类号： B23K26/402 , B23K26/032 , B23K26/066 , B23K26/0661 , B23K26/702 , B23K2103/50 , H01L51/0011
摘要： Provided is a mask for an evaporation apparatus, which includes a first division mask and a second division mask. The first and second division masks are directly bonded to each other by welding, thereby forming welding portion between the first and the second division masks. A method and apparatus for manufacturing a mask for evaporation are also provided. The division masks according to the embodiment do not use subframes, and are directly bonded to one another by welding, so that a shadow effect does not occur. The apparatus for manufacturing a mask for evaporation includes a work stage, a clamp fixing a first division mask and a second division mask to the work stage, and a laser welding part welding the first division mask to the second division mask. The apparatus may further include a first roller leading the laser welding part and a second roller following the laser welding part.
摘要翻译： 提供了一种用于蒸发装置的掩模，其包括第一分隔掩模和第二分隔掩模。 第一和第二分割掩模通过焊接直接接合，从而在第一和第二分隔掩模之间形成焊接部分。 还提供了用于制造用于蒸发的掩模的方法和装置。 根据本实施例的分割掩模不使用子帧，并且通过焊接直接接合，从而不发生阴影效应。 用于制造用于蒸发的掩模的装置包括工作台，将第一分区掩模固定到工作台的夹具和将第一分隔掩模焊接到第二分隔掩模的激光焊接部。 该装置还可以包括引导激光焊接部的第一辊和跟随激光焊接部的第二辊。
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7.发明申请MASK FRAME ASSEMBLY FOR THIN FILM DEPOSITION AND THE MANUFACTURING METHOD THEREOF 有权用于薄膜沉积的掩模框架组件及其制造方法公开(公告)号：US20120145076A1
公开(公告)日：2012-06-14
申请号：US13244100
申请日：2011-09-23
申请人： Eui-Shin Shin , Jae-Seok Park , Young-Geun Cho , Woo-Dong Kim , Kyu-Bum Kim , Jeung-Woo Huh
发明人： Eui-Shin Shin , Jae-Seok Park , Young-Geun Cho , Woo-Dong Kim , Kyu-Bum Kim , Jeung-Woo Huh
CPC分类号： G03F1/00 , C23C14/042 , H01L51/0011 , Y10T29/49826 , Y10T156/10
摘要： A mask frame assembly using a plurality of stick-shaped split masks. The mask frame assembly includes a plurality of split masks, each of which includes a deposition pattern corresponding to a unit screen. Each of the split masks is formed of a plurality of partial masks to form the deposition pattern corresponding to a unit screen. Accordingly, the split masks accommodating a pattern corresponding to a large screen may be easily manufactured without an increase in the amount of etching errors.
摘要翻译： 一种使用多个棒状分割掩模的面罩框架组件。 掩模框架组件包括多个分割掩模，每个分离掩模包括对应于单位屏幕的沉积图案。 每个分割掩模由多个部分掩模形成，以形成对应于单位屏幕的沉积图案。 因此，可以容易地制造适合与大屏幕相对应的图案的分割掩模，而不增加蚀刻误差量。
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8.发明申请公开(公告)号：US20110139365A1
公开(公告)日：2011-06-16
申请号：US12964706
申请日：2010-12-09
申请人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
发明人： Joon-Hyung Kim , Young-Geun Cho , Eui-Shin Shin , Jong-Heon Kim , Seung-Ho Choi , Cheol-Lae Roh , Chang-Mog Jo , Jae-Seok Park
CPC分类号： B23K26/402 , B23K26/032 , B23K26/066 , B23K26/0661 , B23K26/702 , B23K2103/50 , H01L51/0011
摘要： Provided is a mask for an evaporation apparatus, which includes a first division mask and a second division mask. The first and second division masks are directly bonded to each other by welding, thereby forming welding portion between the first and the second division masks. A method and apparatus for manufacturing a mask for evaporation are also provided. The division masks according to the embodiment do not use subframes, and are directly bonded to one another by welding, so that a shadow effect does not occur. The apparatus for manufacturing a mask for evaporation includes a work stage, a clamp fixing a first division mask and a second division mask to the work stage, and a laser welding part welding the first division mask to the second division mask. The apparatus may further include a first roller leading the laser welding part and a second roller following the laser welding part.
摘要翻译： 提供了一种用于蒸发装置的掩模，其包括第一分隔掩模和第二分隔掩模。 第一和第二分割掩模通过焊接直接接合，从而在第一和第二分隔掩模之间形成焊接部分。 还提供了用于制造用于蒸发的掩模的方法和装置。 根据本实施例的分割掩模不使用子帧，并且通过焊接直接接合，从而不发生阴影效应。 用于制造用于蒸发的掩模的装置包括工作台，将第一分区掩模固定到工作台的夹具和将第一分隔掩模焊接到第二分隔掩模的激光焊接部。 该装置还可以包括引导激光焊接部的第一辊和跟随激光焊接部的第二辊。
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