发明授权
US08654307B2 Scanning type exposure apparatus, method of manufacturing micro-apparatus, mask, projection optical apparatus, and method of manufacturing mask
有权
扫描型曝光装置，微型装置的制造方法，掩模，投影光学装置及掩模的制造方法
- 专利标题： Scanning type exposure apparatus, method of manufacturing micro-apparatus, mask, projection optical apparatus, and method of manufacturing mask
- 专利标题（中）： 扫描型曝光装置，微型装置的制造方法，掩模，投影光学装置及掩模的制造方法
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申请号： US11723124申请日： 2007-03-16
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公开(公告)号： US08654307B2公开(公告)日： 2014-02-18
- 发明人: Masaki Kato
- 申请人： Masaki Kato
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JPP2006-075853 20060320; JPP2006-279388 20061013
- 主分类号： G03B27/44
- IPC分类号： G03B27/44 ; G03B27/42 ; G03B27/52 ; G03B27/32 ; G03B27/54
摘要：
It is disclosed a mask on which a pattern for transfer is formed. The mask comprising a first row pattern part and a second row pattern part which are arranged along a first direction on the mask. The whole region of the first row pattern part and the whole region of the second row pattern part region are arranged to deviate from each other by a predetermined amount in a second direction perpendicular to the first direction.
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