Invention Grant
US08697336B2 Composition for forming a developable bottom antireflective coating
有权
用于形成可显影底部抗反射涂层的组合物
- Patent Title: Composition for forming a developable bottom antireflective coating
- Patent Title (中): 用于形成可显影底部抗反射涂层的组合物
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Application No.: US13327030Application Date: 2011-12-15
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Publication No.: US08697336B2Publication Date: 2014-04-15
- Inventor: Shigemasa Nakasugi , Kazuma Yamamoto , Yasushi Akiyama , Shinji Miyazaki , Munirathna Padmanaban , Srinivasan Chakrapani
- Applicant: Shigemasa Nakasugi , Kazuma Yamamoto , Yasushi Akiyama , Shinji Miyazaki , Munirathna Padmanaban , Srinivasan Chakrapani
- Applicant Address: US NJ Somerville
- Assignee: AZ Electronic Materials USA Corp.
- Current Assignee: AZ Electronic Materials USA Corp.
- Current Assignee Address: US NJ Somerville
- Agent Sangya Jain
- Main IPC: G03F7/027
- IPC: G03F7/027 ; G03F7/11 ; G03F7/30 ; G03F7/40 ; H01L21/027
Abstract:
The present invention provides a composition for forming a bottom anti-reflective coating, and also provides a photoresist pattern formation method employing that composition. The composition gives a bottom anti-reflective coating used in a lithographic process for manufacturing semiconductor devices, and the coating can be developed with a developing solution for photoresist. The composition contains a solvent, a polymer having a condensed polycyclic aromatic group, and a compound having a maleimide derivative or a maleic anhydride derivative. The composition may further contain a photo acid generator or a crosslinking agent.
Public/Granted literature
- US20130157196A1 COMPOSITION FOR FORMING A DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING Public/Granted day:2013-06-20
Information query
IPC分类:
