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    Bottom antireflective coating compositions and processes thereof
    2.
    发明授权
    Bottom antireflective coating compositions and processes thereof 有权
    底部抗反射涂料组合物及其工艺

    公开(公告)号：US08623589B2

    公开(公告)日：2014-01-07

    申请号：US13153765

    申请日：2011-06-06

    Applicant: Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    Inventor： Takanori Kudo ,  Alberto Dioses ,  Edward Ng ,  Srinivasan Chakrapani ,  Munirathna Padmanaban

    IPC: G03F7/38 ,  G03F7/40 ,  C09D5/00 ,  G03F7/039 ,  G03F7/11

    CPC classification number: C09D5/006 ,  G03F7/091

    Abstract: The present invention relates to an antireflective coating composition comprising a crosslinking agent, a polymer comprising at least one chromophore group and at least one hydroxyl and/or a carboxyl group, and an additive, further where the additive has structure 1 and comprises at least one arylene-hydroxyl moiety, where Y is selected from an carboxylate anion or sulfonate anion, R1, R2, and R3 are independently selected from unsubstituted C1-C8 alkyl, substituted C1-C8 alkyl, aryl and arylene-hydroxyl; X1, X2, and X3 are independently selected from direct valence bond and C1-C8 alkylene group, and, n=1, 2 or 3. The invention further relates to a process for using the composition.

    Abstract translation: 本发明涉及包含交联剂，包含至少一个发色团和至少一个羟基和/或羧基的聚合物和添加剂的抗反射涂料组合物，此外，其中添加剂具有结构1并且包含至少一个 亚芳基 - 羟基部分，其中Y选自羧酸根阴离子或磺酸根阴离子，R 1，R 2和R 3独立地选自未取代的C 1 -C 8烷基，取代的C 1 -C 8烷基，芳基和亚芳基 - 羟基; X1，X2和X3独立地选自直接键键和C1-C8亚烷基，n = 1,2或3.本发明还涉及使用该组合物的方法。

    Photosensitive Composition
    3.
    发明申请
    Photosensitive Composition 审中-公开
    感光组合

    公开(公告)号：US20100136477A1

    公开(公告)日：2010-06-03

    申请号：US12325627

    申请日：2008-12-01

    Applicant: Edward W. Ng ,  Nelson M. Felix ,  Munirathna Padmanaban ,  Srinivasan Chakrapani

    Inventor： Edward W. Ng ,  Nelson M. Felix ,  Munirathna Padmanaban ,  Srinivasan Chakrapani

    IPC: G03F7/004 ,  G03F7/20

    CPC classification number: G03F7/0045 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/091

    Abstract: The present invention relates to a novel photosensitive composition comprising a) an organic polymer, b) a photobase generator of structure (1), and c) optionally a photoacid generator, (+A1−O2C)—B—(CO2−A2+)x  (1) where A1+ and A2+ are independently an onium cation, x is an integer greater than or equal to 1, and B is a nonfluorinated hydrocarbon moiety. The photosensitive composition may be used as a photoresist composition or be used as an alkali developable antireflective underlayer coating composition.

    Abstract translation: 本发明涉及一种新颖的光敏组合物，其包含a）有机聚合物，b）结构（1）的光碱产生剂，和c）任选的光酸产生剂，（+ A1-O 2 C）-B-（CO 2 -A 2 +）x （1）其中A1 +和A2 +独立地是鎓阳离子，x是大于或等于1的整数，B是非氟化烃部分。 光敏组合物可以用作光致抗蚀剂组合物或用作碱显影性抗反射底层涂料组合物。

    Photoactive Compounds
    4.
    发明申请
    Photoactive Compounds 审中-公开
    光活性化合物

    公开(公告)号：US20080187868A1

    公开(公告)日：2008-08-07

    申请号：US11672077

    申请日：2007-02-07

    Applicant: Munirathna Padmanaban ,  Srinivasan Chakrapani

    Inventor： Munirathna Padmanaban ,  Srinivasan Chakrapani

    IPC: G03C1/00

    CPC classification number: G03F7/0045 ,  G03F7/0392

    Abstract: The present application relates to a composition comprising a) a polymer containing an acid labile group; b) a compound selected from (i), (ii) and mixtures thereof, where (i) is Ai Xi Bi and (ii) is Ai Xi1; and c) a compound of formula Ai Xi2 where Ai, Bi, Xi, Xi1, and Xi2 are defined herein. The compositions are useful in the semiconductor industry.

    Abstract translation: 本申请涉及包含a）含有酸不稳定基团的聚合物的组合物; b）选自（i），（ii）及其混合物的化合物，其中（i）为Ai Xi Bi，（ii）为Ai Xi1; 和c）其中Ai，Bi，Xi，Xi1和Xi2在本文中定义的式Ai Xi2的化合物。 该组合物可用于半导体工业。

    Materials and methods for improving properties of SPD emulsions and films
    5.
    发明申请
    Materials and methods for improving properties of SPD emulsions and films 有权
    用于改善SPD乳液和薄膜性能的材料和方法

    公开(公告)号：US20070006968A1

    公开(公告)日：2007-01-11

    申请号：US11471321

    申请日：2006-06-20

    Applicant: Srinivasan Chakrapani ,  Robert Saxe ,  Steven Slovak

    Inventor： Srinivasan Chakrapani ,  Robert Saxe ,  Steven Slovak

    IPC: B29C65/00

    CPC classification number: G02F1/172 ,  C08F290/068 ,  C08F290/148 ,  C08F293/005 ,  C08F297/02 ,  C08L53/00 ,  Y10T428/1014 ,  C08L2666/02

    Abstract: An emulsifier for use in forming a film for a suspended particle device (SPD) wherein the film is comprised of a cross-linked matrix polymer having a plurality of droplets of a liquid light valve suspension distributed therein. The emulsifier is formed of a copolymer material comprising at least first and second segments, the segments differing from one another in at least one of their chemical affinities, their compositions and their polarities. A first one of the segments is soluble in an uncured liquid matrix polymer used in forming the film, but insoluble in a liquid suspension medium of which the droplets are dispersed. A second segment is soluble in the liquid suspending medium in the droplets and insoluble in the uncured liquid matrix polymer. The first and second segments have substantially the same index of refraction and the index of refraction of the segments is within 0.010 of that of each phase of an emulsion formed with the emulsifier. In one embodiment, the first segment is comprised of a material selected from the group consisting of linear organosiloxanes, branched organosiloxanes, linear alkyl groups, branched alkyl groups, linear fluoroalkyl groups and branched fluoroalkyl groups. The second segment, in turn, is comprised of a material selected from the group consisting of linear esters, branched esters, linear (meth)acrylate, branched (meth)acrylate, linear amide, branched amide, linear amine, branched amine, linear epoxy groups, branched epoxy groups, linear groups comprising hydroxyl or acid groups and branched groups comprising hydroxyl or acid groups. The emulsifier is adapted to substantially prevent coalescence of the droplets of the liquid light valve suspension during formation of the film by retarding the growth of the droplets.

    Abstract translation: 一种用于形成用于悬浮颗粒装置（SPD）的膜的乳化剂，其中所述膜由交联的基质聚合物组成，所述交联基质聚合物具有多个分散在其中的液体光阀悬浮液滴。 乳化剂由包含至少第一和第二链段的共聚物材料形成，所述片段以其化学亲和性，它们的组成和极性中的至少一个彼此不同。 片段中的第一个可溶于用于形成膜的未固化的液体基质聚合物，但不溶于其中分散有液滴的液体悬浮介质。 第二段在液滴中溶于液体悬浮介质中，不溶于未固化的液体基质聚合物。 第一和第二段具有基本相同的折射率，并且片段的折射率在与乳化剂形成的乳液的每个相的相差的0.010以内。 在一个实施方案中，第一段由选自直链有机硅氧烷，支链有机硅氧烷，直链烷基，支链烷基，直链氟烷基和支链氟烷基组成的组中的材料组成。 第二段又由选自直链酯，支链酯，直链（甲基）丙烯酸酯，支链（甲基）丙烯酸酯，直链酰胺，支链酰胺，直链胺，支链胺，直链环氧化物 基团，支链环氧基团，包含羟基或酸基团的直链基团和包含羟基或酸基团的支链基团。 乳化剂适于在通过延迟液滴的生长来形成膜期间基本上防止液体光阀悬浮液的液滴聚结。

    SPD films and light valves comprising same
    6.
    发明授权
    SPD films and light valves comprising same 有权
    SPD膜和包括它的光阀

    公开(公告)号：US06416827B1

    公开(公告)日：2002-07-09

    申请号：US09699160

    申请日：2000-10-27

    Applicant: Srinivasan Chakrapani ,  Steven M. Slovak ,  Robert L. Saxe ,  Barry Fanning

    Inventor： Srinivasan Chakrapani ,  Steven M. Slovak ,  Robert L. Saxe ,  Barry Fanning

    IPC: C09K1902

    CPC classification number: C08J5/18 ,  C08J2383/04 ,  G02F1/172 ,  Y10T428/1041 ,  Y10T428/1059

    Abstract: A film suitable for use as the light-modulating unit of an SPD light valve, the film comprising a cross-linked polymer matrix and having droplets of a liquid light valve suspension distributed in the cross-linked polymer matrix, the liquid light valve suspension comprising particles suspended in a liquid suspending medium, wherein the matrix and the droplets each have a refractive index within a range of from about 1.455 to 1.463 and wherein the refractive index of the droplet and the matrix components of the film are preferably matched as closely as possible within RI 0.005 of each other.

    Abstract translation: 一种适于用作SPD光阀的光调制单元的膜，该膜包含交联聚合物基质并具有分布在交联聚合物基体中的液体光阀悬浮液的液滴，液体光阀悬浮液包含 悬浮在液体悬浮介质中的颗粒，其中基质和液滴各自具有在约1.455至1.463范围内的折射率，并且其中液滴和膜的基质组分的折射率优选尽可能接近地匹配 在RI 0.005内。

    Positive-Working Photoimageable Bottom Antireflective Coating
    9.
    发明申请
    Positive-Working Photoimageable Bottom Antireflective Coating 有权
    正面照相底部防反射涂层

    公开(公告)号：US20110076626A1

    公开(公告)日：2011-03-31

    申请号：US12570923

    申请日：2009-09-30

    Applicant: Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    Inventor： Munirathna Padmanaban ,  Srinivasan Chakrapani ,  Francis M. Houlihan ,  Shinji Miyazaki ,  Edward Ng ,  Mark O. Neisser

    IPC: G03F7/00 ,  G03C1/00

    CPC classification number: G03F7/091

    Abstract: The invention relates to a photoimageable antireflective coating composition capable of forming a pattern by development in an aqueous alkaline solution, comprising, (i) a polymer A soluble in a coating solvent and comprises a chromophore, a crosslinking moiety, and optionally a cleavable group which under acid or thermal conditions produces a functionality which aids in the solubility of the polymer in an aqueous alkaline solution and; (ii) at least one photoacid generator; (iii) a crosslinking agent; (iv) optionally, a thermal acid generator; (v) a polymer B which is soluble in an aqueous alkaline solution prior to development, where polymer B is non-miscible with polymer A and soluble in the coating solvent, and; (vi) a coating solvent composition, and (vii) optionally, a quencher. The invention also relates to a process for imaging the antireflective coating.

    Abstract translation: 本发明涉及能够在碱性水溶液中通过显影形成图案的可光成像抗反射涂料组合物，其包含（i）可溶于涂布溶剂中的聚合物A，其包含发色团，交联部分和任选的可裂解基团， 在酸或热条件下产生有助于聚合物在碱性水溶液中的溶解度的功能; （ii）至少一种光致酸发生剂; （iii）交联剂; （iv）任选的热酸产生剂; （v）聚合物B，其在显影前可溶于碱性水溶液，其中聚合物B与聚合物A不可混溶并可溶于涂布溶剂中; （vi）涂料溶剂组合物，和（vii）任选的猝灭剂。 本发明还涉及用于对抗反射涂层进行成像的方法。

    Materials and methods for improving properties of SPD emulsions and films
    10.
    发明授权
    Materials and methods for improving properties of SPD emulsions and films 有权
    用于改善SPD乳液和薄膜性能的材料和方法

    公开(公告)号：US07847033B2

    公开(公告)日：2010-12-07

    申请号：US11471321

    申请日：2006-06-20

    Applicant: Srinivasan Chakrapani ,  Robert L. Saxe ,  Steven M. Slovak

    Inventor： Srinivasan Chakrapani ,  Robert L. Saxe ,  Steven M. Slovak

    IPC: C09K19/02 ,  C08F283/12

    CPC classification number: G02F1/172 ,  C08F290/068 ,  C08F290/148 ,  C08F293/005 ,  C08F297/02 ,  C08L53/00 ,  Y10T428/1014 ,  C08L2666/02

    Abstract: An emulsifier for use in forming a film for a suspended particle device (SPD) wherein the film is comprised of a cross-linked matrix polymer having a plurality of droplets of a liquid light valve suspension distributed therein. The emulsifier is formed of a copolymer material comprising at least first and second segments, the segments differing from one another in at least one of their chemical affinities, their compositions and their polarities. A first one of the segments is soluble in an uncured liquid matrix polymer used in forming the film, but insoluble in a liquid suspension medium of which the droplets are dispersed. A second segment is soluble in the liquid suspending medium in the droplets and insoluble in the uncured liquid matrix polymer. The first and second segments have substantially the same index of refraction and the index of refraction of the segments is within 0.010 of that of each phase of an emulsion formed with the emulsifier.

    Abstract translation: 一种用于形成用于悬浮颗粒装置（SPD）的膜的乳化剂，其中所述膜由交联的基质聚合物组成，所述交联基质聚合物具有多个分散在其中的液体光阀悬浮液滴。 乳化剂由包含至少第一和第二链段的共聚物材料形成，所述片段以其化学亲和性，它们的组成和极性中的至少一个彼此不同。 片段中的第一个可溶于用于形成膜的未固化液体基质聚合物，但不溶于其中分散有液滴的液体悬浮介质。 第二段在液滴中溶于液体悬浮介质中，不溶于未固化的液体基质聚合物。 第一和第二段具有基本相同的折射率，并且片段的折射率在与乳化剂形成的乳液的每个相的相差的0.010以内。

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