Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US13409752Application Date: 2012-03-01
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Publication No.: US08730448B2Publication Date: 2014-05-20
- Inventor: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
- Applicant: Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03F7/20
Abstract:
A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
Public/Granted literature
- US20120229783A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2012-09-13
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