公开(公告)号：US08730448B2

公开(公告)日：2014-05-20

申请号：US13409752

申请日：2012-03-01

申请人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

发明人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。

公开(公告)号：US20120229783A1

公开(公告)日：2012-09-13

申请号：US13409752

申请日：2012-03-01

申请人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

发明人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Nicolaas Ten Kate ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Laurentius Johannes Adrianus Van Bokhoven ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

IPC分类号： G03B27/52

CPC分类号： G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。

公开(公告)号：US20110007287A1

公开(公告)日：2011-01-13

申请号：US12818724

申请日：2010-06-18

申请人： Johannes Henricus Wilhelmus JACOBS ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

发明人： Johannes Henricus Wilhelmus JACOBS ,  Hans Jansen ,  Jeroen Peter Johannes Bruijstens ,  Ivo Adam Johannes Thomas ,  Gerardus Adrianus Antonius Maria Kusters ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC分类号： G03B27/58

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus comprising a surface which is curved such that a surface-tension drainage force acts in a direction on a film of immersion liquid on the surface.

摘要翻译： 一种浸没式光刻设备，其包括弯曲的表面，使得表面张力引流力沿表面上的浸没液体的膜上的方向作用。

公开(公告)号：US20100066987A1

公开(公告)日：2010-03-18

申请号：US12559664

申请日：2009-09-15

申请人： Jeroen Peter Johannes BRUIJSTENS ,  Richard Joseph BRULS ,  Hans JANSEN ,  Siebe LANDHEER ,  Laurentius Catrinus JORRITSMA ,  Arnout Johannes MEESTER ,  Bauke JANSEN ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano MIRANDA ,  Maurice Martinus Johannes VAN DER LEE ,  Gheorghe TANASA ,  Lambertus Dominicus NOORDAM

发明人： Jeroen Peter Johannes BRUIJSTENS ,  Richard Joseph BRULS ,  Hans JANSEN ,  Siebe LANDHEER ,  Laurentius Catrinus JORRITSMA ,  Arnout Johannes MEESTER ,  Bauke JANSEN ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano MIRANDA ,  Maurice Martinus Johannes VAN DER LEE ,  Gheorghe TANASA ,  Lambertus Dominicus NOORDAM

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03B27/52

摘要： A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

摘要翻译： 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。

公开(公告)号：US20080212046A1

公开(公告)日：2008-09-04

申请号：US11987569

申请日：2007-11-30

申请人： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Josef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

发明人： Michel Riepen ,  Christiaan Alexander Hoogendam ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Josef Maria Direcks ,  Paul Petrus Joannes Berkvens ,  Eva Mondt ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

IPC分类号： G03B27/52

CPC分类号： G03F7/70866 ,  G03F7/70341

摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.

摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。

公开(公告)号：US08928857B2

公开(公告)日：2015-01-06

申请号：US12770356

申请日：2010-04-29

申请人： Ivo Adam Johannes Thomas ,  Siebe Landheer ,  Arnout Johannes Meester ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

发明人： Ivo Adam Johannes Thomas ,  Siebe Landheer ,  Arnout Johannes Meester ,  Marcio Alexandre Cano Miranda ,  Gheorghe Tanasa

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/52 ,  G03F7/70891

摘要： A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system.

摘要翻译： 一种包括投影系统和液体限制结构的光刻设备，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构以及衬底和/或衬底台限定的浸没空间中，其中采取措施 以减少液滴和/或液膜对投影系统的最后一个元件的影响。

公开(公告)号：US08797504B2

公开(公告)日：2014-08-05

申请号：US13408471

申请日：2012-02-29

申请人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

发明人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

公开(公告)号：US08681308B2

公开(公告)日：2014-03-25

申请号：US11898637

申请日：2007-09-13

申请人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

发明人： Paul Petrus Joannes Berkvens ,  Roelof Frederik De Graaf ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul William Scholtes-Van Eijk ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Mathieus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete

IPC分类号： G03B27/52 ,  G03B27/68 ,  G03B27/42 ,  G03B27/32 ,  G03B27/54 ,  G03B27/58

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus is disclosed that includes a fluid confinement system configured to confine fluid to a space between a projection system and a substrate. The fluid confinement system includes a fluid inlet to supply fluid, the fluid inlet connected to an inlet port and an outlet port. The immersion lithographic apparatus further includes a fluid supply system configured to control fluid flow through the fluid inlet by varying the flow rate of fluid provided to the inlet port and the flow rate of fluid removed from the outlet port.

摘要翻译： 公开了一种浸没式光刻设备，其包括被配置为将流体限制在投影系统和基板之间的空间的流体限制系统。 流体限制系统包括用于供应流体的流体入口，流体入口连接到入口端口和出口端口。 浸没式光刻设备还包括流体供应系统，其构造成通过改变提供给入口的流体的流量和从出口移除的流体的流速来控制流过流体入口的流体流动。

公开(公告)号：US20110005603A1

公开(公告)日：2011-01-13

申请号：US12820991

申请日：2010-06-22

申请人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

发明人： Hrishikesh Patel ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Ronald Van Der Ham ,  Wilhelmus Franciscus Johannes Simons ,  Daniel Jozef Maria Direcks ,  Franciscus Johannes Joseph Janssen ,  Paul Petrus Joannes Berkvens ,  Gert-Jan Gerardus Johannes Thomas Brands ,  Koen Steffens ,  Han Henricus Aldegonda Lempens ,  Matheus Anna Karel Van Lierop ,  Christophe De Metsenaere ,  Marcio Alexandre Cano Miranda ,  Patrick Johannes Wilhelmus Spruytenburg ,  Joris Johan Anne-Marie Verstraete ,  Ruud Hendricus Martinus Johannes Bloks

IPC分类号： F03B11/00

CPC分类号： H01L21/6715 ,  Y10T137/0318 ,  Y10T137/8593

摘要： A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

摘要翻译： 公开了一种流体处理结构，其被配置为将浸没液体供应并限制在限定在投影系统和面向流体处理结构的面对表面之间的空间中。 流体处理结构包括一个供给通道，用于将流体从流体处理结构外部通过到该空间;以及热隔离器，其至少部分地邻近供给通道定位，以将供给通道中的流体与由 流体处理结构。

公开(公告)号：US20090316121A1

公开(公告)日：2009-12-24

申请号：US12486425

申请日：2009-06-17

申请人： Franciscus Johannes Joseph JANSSEN ,  Siebe Landheer ,  Yucel Kok ,  Marcel Beckers ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda

发明人： Franciscus Johannes Joseph JANSSEN ,  Siebe Landheer ,  Yucel Kok ,  Marcel Beckers ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda

IPC分类号： G03B27/52

CPC分类号： G03F7/70891 ,  G03F7/70341 ,  G03F7/70725

摘要： A lithographic apparatus of the immersion type is disclosed. In the apparatus, a plurality of heating and/or cooling devices are provided in the vicinity of the final element of the projection system, e.g. in a barrier member of a liquid handling system. The heating and/or cooling devices can be used, for example, to control temperature gradients in the final element of the projection system to control aberrations therein.

摘要翻译： 公开了一种浸没式光刻设备。 在该装置中，在投影系统的最终元件附近设置多个加热和/或冷却装置。 在液体处理系统的阻挡构件中。 加热和/或冷却装置可用于例如控制投影系统的最终元件中的温度梯度以控制其中的像差。