发明授权
US08753474B2 Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor
有权
感应耦合等离子体反应器中高效气体解离的方法和装置
- 专利标题： Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor
- 专利标题（中）： 感应耦合等离子体反应器中高效气体解离的方法和装置
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申请号： US12878582申请日： 2010-09-09
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公开(公告)号： US08753474B2公开(公告)日： 2014-06-17
- 发明人: Roy C. Nangoy , Saravjeet Singh , Jon C. Farr , Sharma V. Pamarthy , Ajay Kumar
- 申请人： Roy C. Nangoy , Saravjeet Singh , Jon C. Farr , Sharma V. Pamarthy , Ajay Kumar
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Patterson & Sheridan, LLP
- 主分类号： H01L21/3065
- IPC分类号： H01L21/3065 ; H01J37/32 ; C23C16/455 ; C23C16/505 ; H01L21/67
摘要：
Embodiments of the present invention relate to method and apparatus for providing processing gases to a process chamber with improved plasma dissociation efficiency. One embodiment of the present invention provides a baffle nozzle assembly comprising an outer body defining an extension volume connected to a processing chamber. A processing gas is flown to the processing chamber through the extension volume which is exposed to power source for plasma generation.
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