Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery
    4.
    发明授权
    Method and apparatus for fast gas exchange, fast gas switching, and programmable gas delivery 有权
    用于快速气体交换,快速气体切换和可编程气体输送的方法和装置

    公开(公告)号:US09305810B2

    公开(公告)日:2016-04-05

    申请号:US13456006

    申请日:2012-04-25

    IPC分类号: F17D1/00 H01L21/67

    摘要: Embodiments of the invention relate to a gas delivery system. The gas delivery system includes a fast gas exchange module in fluid communication with one or more gas panels and a process chamber. The fast gas exchange module has first and second sets of flow controllers and each of first and second sets of flow controllers has multiple flow controllers. The flow controller is configured such that each of the flow controllers in the first and second sets of the flow controllers is independently operated to selectively open to divert gas to the process chamber or an exhaust. The first and second sets of flow controllers are operated for synchronized switching of gases in a pre-determined timed sequence of flow controller actuation. The invention enables fast switch of resultant gas flow in the process chamber while having individual flow controller operated at lower switching speed to provide longer service life.

    摘要翻译: 本发明的实施例涉及一种气体输送系统。 气体输送系统包括与一个或多个气体板和处理室流体连通的快速气体交换模块。 快速气体交换模块具有第一和第二组流量控制器,并且第一和第二组流量控制器中的每一个具有多个流量控制器。 流量控制器被配置为使得第一和第二组流量控制器中的每个流量控制器被独立地操作以选择性地打开以将气体转移到处理室或排气口。 第一和第二组流量控制器用于以预定的流量控制器致动的定时顺序同步切换气体。 本发明能够在处理室中快速切换合成气流,同时具有以较低切换速度操作的各个流量控制器以提供更长的使用寿命。

    High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity
    5.
    发明授权
    High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity 有权
    电感耦合等离子体反应器中高效率的气体离解具有改善的均匀性

    公开(公告)号:US08920599B2

    公开(公告)日:2014-12-30

    申请号:US13270623

    申请日:2011-10-11

    摘要: Embodiments of the present invention relate to a plasma chamber having a coil assembly which improves plasma uniformity and improves power coupling to the plasma. One embodiment provides a plasma chamber. The plasma chamber includes a chamber body having sidewalls and a lid, wherein the chamber body defines a processing volume. The plasma chamber further includes a coil assembly disposed over the lid configured to generate inductively coupled plasma within the processing volume, wherein the coil assembly comprises two or more horizontal coils arranged in a common horizontal plane.

    摘要翻译: 本发明的实施例涉及具有提高等离子体均匀性并改善与等离子体的功率耦合的线圈组件的等离子体室。 一个实施例提供等离子体室。 等离子体室包括具有侧壁和盖的室主体,其中室主体限定处理容积。 等离子体室还包括设置在盖上方的线圈组件,其被配置为在处理体积内产生电感耦合等离子体,其中线圈组件包括布置在公共水平面中的两个或更多个水平线圈。

    HIGH EFFICIENCY GAS DISSOCIATION IN INDUCTIVELY COUPLED PLASMA REACTOR WITH IMPROVED UNIFORMITY
    6.
    发明申请
    HIGH EFFICIENCY GAS DISSOCIATION IN INDUCTIVELY COUPLED PLASMA REACTOR WITH IMPROVED UNIFORMITY 有权
    具有改进均匀性的电感耦合等离子体反应器中的高效气体分离

    公开(公告)号:US20120091098A1

    公开(公告)日:2012-04-19

    申请号:US13270623

    申请日:2011-10-11

    摘要: Embodiments of the present invention relate to a plasma chamber having a coil assembly which improves plasma uniformity and improves power coupling to the plasma. One embodiment provides a plasma chamber. The plasma chamber includes a chamber body having sidewalls and a lid, wherein the chamber body defines a processing volume. The plasma chamber further includes a coil assembly disposed over the lid configured to generate inductively coupled plasma within the processing volume, wherein the coil assembly comprises two or more horizontal coils arranged in a common horizontal plane.

    摘要翻译: 本发明的实施例涉及具有提高等离子体均匀性并改善与等离子体的功率耦合的线圈组件的等离子体室。 一个实施例提供等离子体室。 等离子体室包括具有侧壁和盖的室主体,其中室主体限定处理容积。 等离子体室还包括设置在盖上方的线圈组件,其被配置为在处理体积内产生电感耦合等离子体,其中线圈组件包括布置在公共水平面中的两个或更多个水平线圈。

    DYNAMIC ION RADICAL SIEVE AND ION RADICAL APERTURE FOR AN INDUCTIVELY COUPLED PLASMA (ICP) REACTOR
    10.
    发明申请
    DYNAMIC ION RADICAL SIEVE AND ION RADICAL APERTURE FOR AN INDUCTIVELY COUPLED PLASMA (ICP) REACTOR 有权
    用于感应耦合等离子体(ICP)反应器的动态离子辐射和离子射孔

    公开(公告)号:US20120305184A1

    公开(公告)日:2012-12-06

    申请号:US13455342

    申请日:2012-04-25

    IPC分类号: H01L21/3065

    摘要: Embodiments described herein provide apparatus and methods of etching a substrate using an ion etch chamber having a movable aperture. The ion etch chamber has a chamber body enclosing a processing region, a substrate support disposed in the processing region and having a substrate receiving surface, a plasma source disposed at a wall of the chamber body facing the substrate receiving surface, an ion-radical shield disposed between the plasma source and the substrate receiving surface, and a movable aperture member between the ion-radical shield and the substrate receiving surface. The movable aperture member is actuated by a lift assembly comprising a lift ring and lift supports from the lift ring to the aperture member. The ion-radical shield is supported by shield supports disposed through the aperture member. The aperture size, shape, and/or central axis location may be changed using inserts.

    摘要翻译: 本文描述的实施例提供了使用具有可移动孔径的离子蚀刻室蚀刻衬底的设备和方法。 离子蚀刻室具有包围处理区域的室主体,设置在处理区域中并具有基板接收表面的基板支撑件,设置在室主体面向基板接收表面的壁上的等离子体源,离子基屏蔽 设置在等离子体源和基板接收表面之间,以及位于离子基屏蔽和基板接收表面之间的可移动孔径构件。 可移动孔径构件由包括提升环的提升组件和从提升环提升到孔径构件的提升支撑件致动。 离子基屏蔽由通过孔径构件设置的屏蔽支撑件支撑。 孔径尺寸,形状和/或中心轴位置可以使用插入件来改变。