Invention Grant
US08790861B2 Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer
有权
环脂族单体,包含其的聚合物和包含该聚合物的光致抗蚀剂组合物
- Patent Title: Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer
- Patent Title (中): 环脂族单体,包含其的聚合物和包含该聚合物的光致抗蚀剂组合物
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Application No.: US13723973Application Date: 2012-12-21
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Publication No.: US08790861B2Publication Date: 2014-07-29
- Inventor: Cong Liu , Mingqi Li , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials LLC
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/09 ; G03F7/20 ; C07C69/54 ; C08F20/68

Abstract:
A monomer has the Formula I: wherein R1, R2, and R3 are each independently a C1-30 monovalent organic group, and R1, R2, and R3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R4 includes H, F, C1-4 alkyl, or C1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
Public/Granted literature
- US20130171549A1 CYCLOALIPHATIC MONOMER, POLYMER COMPRISING THE SAME, AND PHOTORESIST COMPOSITION COMPRISING THE POLYMER Public/Granted day:2013-07-04
Information query
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