Invention Grant
- Patent Title: Multi charged particle beam writing apparatus
- Patent Title (中): 多带电粒子束写入装置
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Application No.: US14108844Application Date: 2013-12-17
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Publication No.: US08835868B2Publication Date: 2014-09-16
- Inventor: Takanao Touya , Munehiro Ogasawara
- Applicant: NuFlare Technology, Inc.
- Applicant Address: JP Yokohama
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2012-282716 20121226
- Main IPC: H01J3/07
- IPC: H01J3/07 ; H01J37/141 ; G21K5/04 ; H01J37/317

Abstract:
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to produce multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of a plurality of openings, a reduction optical system to reduce the multiple beams, and a doublet lens, arranged at the subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.
Public/Granted literature
- US20140175302A1 MULTI CHARGED PARTICLE BEAM WRITING APPARATUS Public/Granted day:2014-06-26
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