发明授权
US08854628B2 Interferometric methods for metrology of surfaces, films and underresolved structures
有权
用于测量表面,薄膜和欠解析结构的干涉测量方法
- 专利标题: Interferometric methods for metrology of surfaces, films and underresolved structures
- 专利标题(中): 用于测量表面,薄膜和欠解析结构的干涉测量方法
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申请号: US13238732申请日: 2011-09-21
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公开(公告)号: US08854628B2公开(公告)日: 2014-10-07
- 发明人: Xavier M. Colonna de Lega , Peter J. de Groot , Jan Liesener
- 申请人: Xavier M. Colonna de Lega , Peter J. de Groot , Jan Liesener
- 申请人地址: US CT Middlefield
- 专利权人: Zygo Corporation
- 当前专利权人: Zygo Corporation
- 当前专利权人地址: US CT Middlefield
- 代理机构: Fish & Richardson P.C.
- 主分类号: G01B9/02
- IPC分类号: G01B9/02 ; G01B11/02 ; G01N21/41 ; G01N21/43 ; G01N21/21 ; G01N21/45 ; G01N21/47 ; G01B11/06
摘要:
A method for determining information about a test object includes combining two or more scanning interference signals to form a synthetic interference signal; analyzing the synthetic interference signal to determine information about the test object; and outputting the information about the test object. Each of the two or more scanning interference signals correspond to interference between test light and reference light as an optical path length difference between the test and reference light is scanned, wherein the test and reference light are derived from a common source. The test light scatters from the test object over a range of angles and each of the two or more scanning interferometry signals corresponds to a different scattering angle or polarization state of the test light.
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