发明授权
- 专利标题： Compositions and processes for immersion lithography
- 专利标题（中）： 浸没光刻的组成和工艺
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申请号： US13602259申请日： 2012-09-03
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公开(公告)号： US08871428B2公开(公告)日： 2014-10-28
- 发明人: Deyan Wang , Cheng-Bai Xu , George G. Barclay
- 申请人： Deyan Wang , Cheng-Bai Xu , George G. Barclay
- 申请人地址： US MA Marlborough
- 专利权人： Rohm and Haas Electronics Materials LLC
- 当前专利权人： Rohm and Haas Electronics Materials LLC
- 当前专利权人地址： US MA Marlborough
- 代理机构： Edwards Wildman Palmer LLP
- 代理商 Peter F. Corless
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/20 ; G03F7/028
摘要：
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
公开/授权文献
- US20130065178A1 COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY 公开/授权日：2013-03-14
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