发明授权
- 专利标题: Method of forming pattern and developer for use in the method
- 专利标题(中): 形成图案和显影剂的方法用于该方法
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申请号: US13808496申请日: 2011-08-26
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公开(公告)号: US08871642B2公开(公告)日: 2014-10-28
- 发明人: Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Keita Kato , Kana Fujii
- 申请人: Yuichiro Enomoto , Shinji Tarutani , Sou Kamimura , Keita Kato , Kana Fujii
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2010-191396 20100827; JP2011-182937 20110824
- 国际申请: PCT/JP2011/069968 WO 20110826
- 国际公布: WO2012/026622 WO 20120301
- 主分类号: H01L21/312
- IPC分类号: H01L21/312 ; H01L21/3105 ; G03F7/039 ; G03F7/32 ; G03F7/40 ; G03F7/20 ; H01L29/02 ; G03F7/038
摘要:
Provided is a method of forming a pattern, including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, (c) developing the exposed film with a developer containing an organic solvent, and (d) rinsing the developed film with a rinse liquid containing an organic solvent, which rinse liquid has a specific gravity larger than that of the developer.
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