Invention Grant
US08889336B2 Radiation-sensitive resin composition and radiation-sensitive acid generating agent
有权
辐射敏感性树脂组合物和辐射敏感性酸产生剂
- Patent Title: Radiation-sensitive resin composition and radiation-sensitive acid generating agent
- Patent Title (中): 辐射敏感性树脂组合物和辐射敏感性酸产生剂
-
Application No.: US13905170Application Date: 2013-05-30
-
Publication No.: US08889336B2Publication Date: 2014-11-18
- Inventor: Ken Maruyama
- Applicant: JSR Corporation
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-269555 20101202
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/028 ; G03F7/039 ; C07C309/01 ; C07C309/06 ; G03F7/027 ; G03F7/029 ; C08F220/10 ; C08K5/42 ; C08L33/04 ; G03F7/20

Abstract:
A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.
Public/Granted literature
- US20130260316A1 RADIATION-SENSITIVE RESIN COMPOSITION AND RADIATION-SENSITIVE ACID GENERATING AGENT Public/Granted day:2013-10-03
Information query
IPC分类: