发明授权
- 专利标题: Microstructure manufacturing method and microstructure
- 专利标题(中): 微结构制造方法和微观结构
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申请号: US13023454申请日: 2011-02-08
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公开(公告)号: US08908274B2公开(公告)日: 2014-12-09
- 发明人: Takayuki Teshima , Shinan Wang , Yutaka Setomoto , Takashi Nakamura
- 申请人: Takayuki Teshima , Shinan Wang , Yutaka Setomoto , Takashi Nakamura
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Canon U.S.A., Inc. IP Division
- 优先权: JP2010-028177 20100210
- 主分类号: G02B5/18
- IPC分类号: G02B5/18 ; C23C18/16 ; C23C18/18 ; C25D5/10 ; C25D5/12 ; C25D5/50 ; G21K1/06 ; C25D7/12 ; C25D5/02
摘要:
A microstructure manufacturing method includes: preparing a mold having on a front side thereof a plurality of fine structures, with conductivity being imparted to a bottom portion between the plurality of fine structures; forming a first plating layer between the plurality of fine structures by plating the bottom portion; and forming a second plating layer of larger stress than the first plating layer on the first plating layer between the plurality of fine structures, wherein the stress of the second plating layer is used to curve a back side surface of the mold.
公开/授权文献
- US20110194673A1 MICROSTRUCTURE MANUFACTURING METHOD AND MICROSTRUCTURE 公开/授权日:2011-08-11
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