发明授权
US08968512B2 Temperature adjusting mechanism and semiconductor manufacturing apparatus using temperature adjusting mechanism 有权
温度调节机构和使用温度调节机构的半导体制造装置

Temperature adjusting mechanism and semiconductor manufacturing apparatus using temperature adjusting mechanism
摘要:
Provided is a temperature adjusting mechanism, which can keep deviation of a temperature of a portion in contact with the temperature adjusting mechanism to be small by controlling the temperature accurately at a high speed. A semiconductor manufacturing apparatus using such temperature adjusting mechanism is also provided. A cooling jacket (6) is provided with a cooling channel (61), and a heat lane (62). The heat lane (62) is provided with a heat receiving section (63), and a heat dissipating section (64), and seals a two-phase condensable working fluid (hereinafter referred to as the working liquid) in an annular narrow tube alternately folds back and forth therebetween. The heat dissipating section (64) is a portion to be cooled by the cooling channel (61), and the heat receiving section (63) is a portion having a temperature higher than that of the heat dissipating section (64). In the heat receiving section (63), heat is received, the working liquid is self-excited by nucleate boiling, and the working liquid transfers sensible heat while being circulated. Furthermore, in the heat receiving section (63), a liquid phase absorbs heat and the phase is transformed into a vapor phase, and in the heat dissipating section (64), a vapor phase dissipates heat and is cooled and condensed, the phase is transformed into a liquid phase, and latent heat is transferred by vapor-liquid phase transformation. Heat is transferred between the heat receiving section (63) and the heat dissipating section (64), and the temperature is uniformized in a short time.
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