发明授权
US08991330B2 Substrate support structure, clamp preparation unit, and lithography system
有权
基板支撑结构，夹具准备单元和光刻系统
- 专利标题： Substrate support structure, clamp preparation unit, and lithography system
- 专利标题（中）： 基板支撑结构，夹具准备单元和光刻系统
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申请号： US12709645申请日： 2010-02-22
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公开(公告)号： US08991330B2公开(公告)日： 2015-03-31
- 发明人: Hendrik Jan De Jong
- 申请人： Hendrik Jan De Jong
- 申请人地址： NL Delft
- 专利权人： Mapper Lithography IP B.V.
- 当前专利权人： Mapper Lithography IP B.V.
- 当前专利权人地址： NL Delft
- 代理机构： Hoyng Monegier LLP
- 代理商 David P. Owen
- 主分类号： B05C13/00
- IPC分类号： B05C13/00 ; G03B27/42 ; H01L21/67 ; B82Y10/00 ; B82Y40/00 ; G03B27/58 ; G03F7/20 ; H01J37/20 ; H01J37/317 ; H01L21/00
摘要：
A substrate support structure for clamping a substrate by means of a capillary force created by a liquid clamping layer having a lower pressure than its surroundings. The substrate support structure comprises a surface provided with a plurality of substrate supporting elements for holding the substrate, and the surface further comprises portions with different capillary potential for inducing, during clamping, a predetermined capillary flow within the liquid clamping layer.