发明授权
- 专利标题: Integrated circuit including DRAM and SRAM/logic
- 专利标题(中): 集成电路包括DRAM和SRAM /逻辑
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申请号: US13551714申请日: 2012-07-18
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公开(公告)号: US08994085B2公开(公告)日: 2015-03-31
- 发明人: Veeraraghavan S. Basker , Kangguo Cheng , Bruce B. Doris , Terence B. Hook , Ali Khakifirooz , Pranita Kulkarni , Tenko Yamashita , Chun-Chen Yeh
- 申请人: Veeraraghavan S. Basker , Kangguo Cheng , Bruce B. Doris , Terence B. Hook , Ali Khakifirooz , Pranita Kulkarni , Tenko Yamashita , Chun-Chen Yeh
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Cantor Colburn LLP
- 代理商 Vazken Alexanian
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L29/76 ; H01L29/94 ; H01L31/119 ; H01L21/84 ; H01L27/11 ; H01L27/12
摘要:
An integrated circuit comprising an N+ type layer, a buffer layer arranged on the N+ type layer; a P type region formed on with the buffer layer; an insulator layer overlying the N+ type layer, a silicon layer overlying the insulator layer, an embedded RAM FET formed in the silicon layer and connected with a conductive node of a trench capacitor that extends into the N+ type layer, the N+ type layer forming a plate electrode of the trench capacitor, a first contact through the silicon layer and the insulating layer and electrically connecting to the N+ type layer, a first logic RAM FET formed in the silicon layer above the P type region, the P type region functional as a P-type back gate of the first logic RAM FET, and a second contact through the silicon layer and the insulating layer and electrically connecting to the P type region.
公开/授权文献
- US20130175594A1 INTEGRATED CIRCUIT INCLUDING DRAM AND SRAM/LOGIC 公开/授权日:2013-07-11
信息查询
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