Invention Grant
US09041159B2 Epitaxial structure and epitaxial growth method for forming epitaxial layer with cavities 有权
外延结构和外延生长方法,用于形成具有空腔的外延层

Epitaxial structure and epitaxial growth method for forming epitaxial layer with cavities
Abstract:
An epitaxial growth method includes the steps of: providing a substrate; forming a sacrifice layer on the substrate; patterning the sacrifice layer to form a plurality of bumps spaced apart from each other on the substrate; epitaxially forming a first epitaxial layer on the substrate to cover a portion of each of the bumps; removing the bumps to form a plurality of cavities; and epitaxially forming a second epitaxial layer on the first epitaxial layer such that the cavities are enclosed by the first epitaxial layer and the second epitaxial layer. An epitaxial structure grown by the method is disclosed as well.
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