发明授权
US09045828B2 RF plasma reactor having a distribution chamber with at least one grid
有权
RF等离子体反应器具有至少一个栅格的分配室
- 专利标题: RF plasma reactor having a distribution chamber with at least one grid
- 专利标题(中): RF等离子体反应器具有至少一个栅格的分配室
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申请号: US11877419申请日: 2007-10-23
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公开(公告)号: US09045828B2公开(公告)日: 2015-06-02
- 发明人: Emmanuel Turlot , Jean-Baptiste Chevrier , Jacques Schmitt , Jean Barreiro
- 申请人: Emmanuel Turlot , Jean-Baptiste Chevrier , Jacques Schmitt , Jean Barreiro
- 申请人地址: CH Truebbach
- 专利权人: TEL Solar AG
- 当前专利权人: TEL Solar AG
- 当前专利权人地址: CH Truebbach
- 代理机构: Crowell & Moring LLP
- 主分类号: C23C16/507
- IPC分类号: C23C16/507 ; C23C16/509 ; H01J1/00 ; C23F1/00 ; C23C16/455 ; H01J37/32 ; C23C16/06 ; C23C16/22
摘要:
A plasma reactor has a reactor vessel and a pair of electrodes in the form of spaced apart and oppositely disposed metallic surfaces defining therebetween a plasma discharge space. At least one of the metallic surfaces is the surface of a metallic plate having a plurality of gas feed openings extending through the metallic surface towards said discharge space and from a distribution chamber extending along the plate opposite the discharge space. The distribution chamber has a wall opposite and distant from the plate and includes a gas inlet arrangement with a plurality of gas inlet openings distributed along the wall and connected to one or more gas feed lines to the reactor. A gas flow resistant coefficient between the one or more gas feed lines and at least a predominant portion of the connected inlet openings are at least substantially equal.
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