Invention Grant
- Patent Title: Method for imaging a sample in a charged particle apparatus
- Patent Title (中): 在带电粒子装置中成像样品的方法
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Application No.: US14294772Application Date: 2014-06-03
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Publication No.: US09053899B2Publication Date: 2015-06-09
- Inventor: Bohuslav Sed'a , Lubomír T{dot over (u)}ma , Petr Hlavenka , Petr Syta{hacek over (r)}
- Applicant: FEI Company
- Applicant Address: US OR Hillsoboro
- Assignee: FEI COMPANY
- Current Assignee: FEI COMPANY
- Current Assignee Address: US OR Hillsoboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg
- Priority: EP13170553 20130605
- Main IPC: H01J37/28
- IPC: H01J37/28 ; H01J37/20 ; H01J37/12 ; H01J37/09 ; H01J37/30

Abstract:
The invention relates to a dual beam apparatus equipped with an ion beam column and an electron beam column having an electrostatic immersion lens. When tilting the sample, the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as traverse chromatic aberration and beam displacement. Also in-column detectors, detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample.The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced.
Public/Granted literature
- US20140361165A1 METHOD FOR IMAGING A SAMPLE IN A CHARGED PARTICLE APPARATUS Public/Granted day:2014-12-11
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