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    MULTI-BEAM CHARGED PARTICLE IMAGING APPARATUS
    1.
    发明申请
    MULTI-BEAM CHARGED PARTICLE IMAGING APPARATUS 审中-公开

    公开(公告)号：US20190393013A1

    公开(公告)日：2019-12-26

    申请号：US16451319

    申请日：2019-06-25

    Applicant: FEI Company

    Inventor： Bohuslav Sed'a ,  Ali Mohammadi-Gheidari ,  Marek Uncovský

    IPC: H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/20

    Abstract: A charged particle imaging apparatus comprising: A specimen holder, for holding a specimen; A particle-optical column, for: Producing a plurality of charged particle beams, by directing a progenitor charged particle beam onto an aperture plate having a corresponding plurality of apertures within a footprint of the progenitor beam; Directing said beams toward said specimen, wherein: Said aperture plate comprises a plurality of different zones, which comprise mutually different aperture patterns, arranged within said progenitor beam footprint; The particle-optical column comprises a selector device, located downstream of said aperture plate, for selecting a beam array from a chosen one of said zones to be directed onto the specimen.

    In-column detector for particle-optical column
    4.
    发明授权
    In-column detector for particle-optical column 有权
    粒子 - 光学柱的柱内检测器

    公开(公告)号：US09362086B2

    公开(公告)日：2016-06-07

    申请号：US13975809

    申请日：2013-08-26

    Applicant: FEI Company

    Inventor： Lubomír Tůma ,  Petr Hlavenka ,  Petr Syta{hacek over (r)} ,  Radek {hacek over (C)}e{hacek over (s)}ka ,  Bohuslav Sed'a

    IPC: H01J37/244 ,  H01J37/21 ,  H01J37/26 ,  H01J37/145 ,  H01J37/28

    CPC classification number: H01J37/26 ,  H01J37/145 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04926 ,  H01J2237/2443 ,  H01J2237/24465

    Abstract: The invention relates to an in-column back-scattered electron detector, the detector placed in a combined electrostatic/magnetic objective lens for a SEM. The detector is formed as a charged particle sensitive surface, preferably a scintillator disk that acts as one of the electrode faces forming the electrostatic focusing field. The photons generated in the scintillator are detected by a photon detector, such as a photo-diode or a multi-pixel photon detector. The objective lens may be equipped with another electron detector for detecting secondary electrons that are kept closer to the axis. A light guide may be used to offer electrical insulation between the photon detector and the scintillator.

    Abstract translation: 本发明涉及一种柱内反向散射电子检测器，该探测器放置在用于SEM的组合静电/磁性物镜中。 检测器形成为带电粒子敏感表面，优选地形成作为形成静电聚焦场的电极面之一的闪烁体盘。 在闪烁体中产生的光子被光子检测器（例如光电二极管或多像素光子检测器）检测。 物镜可以配备有用于检测保持靠近轴线的二次电子的另一电子检测器。 可以使用光导来在光子检测器和闪烁体之间提供电绝缘。

    MINIMIZATION OF ENERGY SPREAD IN FOCUSED ION BEAM (FIB) SYSTEMS
    5.
    发明申请
    MINIMIZATION OF ENERGY SPREAD IN FOCUSED ION BEAM (FIB) SYSTEMS 有权

    公开(公告)号：US20250157779A1

    公开(公告)日：2025-05-15

    申请号：US18506957

    申请日：2023-11-10

    Applicant: FEI Company

    Inventor： Radovan Vašina ,  Bohuslav Sed'a ,  Mostafa Maazouz ,  Lukáš Král

    IPC: H01J37/05 ,  H01J37/04 ,  H01J37/10 ,  H01J37/147

    Abstract: Charged-particle beam (CPB) optical systems can include a beam acceptance aperture plate defining a first acceptance aperture and at least one second acceptance aperture, situated with respect to a CPB source so that a first CPB is transmitted by the first acceptance aperture and a second CPB is transmitted by a second acceptance aperture. A CPB lens is situated to receive the first and second CPBs from the beam acceptance aperture plate and direct the first and second CPBs towards a filter aperture plate to transmit selected spectral portion of the second CPB. The selected spectral component of the first CPB can be selectively directed to a workpiece by a beam steering deflector along the same axis. In some examples, the first and second CPBs have different beam currents and only one is directed to a workpiece.

    3D defect characterization of crystalline samples in a scanning type electron microscope
    6.
    发明授权
    3D defect characterization of crystalline samples in a scanning type electron microscope 有权

    公开(公告)号：US10784076B2

    公开(公告)日：2020-09-22

    申请号：US16119017

    申请日：2018-08-31

    Applicant: FEI Company

    Inventor： Tomá{hacek over (s)} Vystav{hacek over (e)}l ,  Bohuslav Sed'a ,  Anna Prokhodtseva

    IPC: H01J37/20 ,  H01J37/22 ,  H01J37/244 ,  H01J37/06 ,  H01J37/28

    Abstract: The invention relates to a method 3D defect characterization of crystalline samples in a scanning type electron microscope. The method comprises Irradiating a sample provided on a stage, selecting one set of crystal lattice planes of the sample and orienting said set to a first Bragg condition with respect to a primary electron beam impinging on said sample, and obtaining Electron Channeling Contrast Image for an area of interest on the sample. The method is characterized by performing, at least once, the steps of orienting said selected set of crystal lattice planes to a further Bragg condition by at least tilting the sample stage with the sample by a user-selected angle about a first tilt axis, and obtaining by Electron Channeling Contrast Image for a further area of interest.

    METHOD TO CORRECT FIRST ORDER ASTIGMATISM AND FIRST ORDER DISTORTION IN MULTI-BEAM SCANNING ELECTRON MICROSCOPES
    8.
    发明申请
    METHOD TO CORRECT FIRST ORDER ASTIGMATISM AND FIRST ORDER DISTORTION IN MULTI-BEAM SCANNING ELECTRON MICROSCOPES 有权

    公开(公告)号：US20220328284A1

    公开(公告)日：2022-10-13

    申请号：US17694549

    申请日：2022-03-14

    Applicant: FEI Company

    Inventor： Jan Stopka ,  Bohuslav Sed'a

    IPC: H01J37/28 ,  H01J37/153 ,  H01J37/10

    Abstract: An example multi-beam scanning electron microscope (MB-SEM) for correcting both astigmatism and linear distortion at least includes an electron source coupled to provide an electron beam, an aperture plate comprising an array of apertures, the aperture plate arranged to form an array of electron beamlets from the electron beam, and an electron column including a plurality of lenses and first and second stigmators, the electron column coupled to direct the array of electron beamlets toward a sample, wherein the first and second stigmators are arranged and excited to correct both astigmatism and linear distortion.

    Multi-beam electron microscope
    9.
    发明授权
    Multi-beam electron microscope 有权

    公开(公告)号：US10937627B2

    公开(公告)日：2021-03-02

    申请号：US16423670

    申请日：2019-05-28

    Applicant: FEI Company

    Inventor： Pavel Stejskal ,  Petr Hlavenka ,  Bohuslav Sed'a

    IPC: H01J37/244 ,  H01J37/20 ,  H01J37/28

    Abstract: An electron microscope comprising: A specimen holder, for holding a specimen; An electron beam column, for producing an array of electron beams and concurrently irradiating an array of target areas of said specimen therewith; A scanning assembly, for producing relative scanning motion of said beam array with respect to the specimen; A detector, for detecting radiation emanating from the specimen in response to said irradiation, wherein said detector is: A backscattered electron detector that can be disposed proximal to the specimen at a side thereof facing said electron beam column; Provided with an array of apertures that allow passage of said electron beams from said column to the specimen; Provided with a functionally sub-divided detection surface that enables segregated detection of a backscattered electron flux produced by each individual beam.

    Method for imaging a sample in a charged particle apparatus
    10.
    发明授权
    Method for imaging a sample in a charged particle apparatus 有权
    在带电粒子装置中成像样品的方法

    公开(公告)号：US09053899B2

    公开(公告)日：2015-06-09

    申请号：US14294772

    申请日：2014-06-03

    Applicant: FEI Company

    Inventor： Bohuslav Sed'a ,  Lubomír T{dot over (u)}ma ,  Petr Hlavenka ,  Petr Syta{hacek over (r)}

    IPC: H01J37/28 ,  H01J37/20 ,  H01J37/12 ,  H01J37/09 ,  H01J37/30

    CPC classification number: H01J37/12 ,  H01J37/09 ,  H01J37/3005 ,  H01J2237/12 ,  H01J2237/20207

    Abstract: The invention relates to a dual beam apparatus equipped with an ion beam column and an electron beam column having an electrostatic immersion lens. When tilting the sample, the electrostatic immersion field is distorted and the symmetry round the electron optical axis is lost. As a consequence tilting introduces detrimental effects such as traverse chromatic aberration and beam displacement. Also in-column detectors, detecting either secondary electrons or backscattered electrons in the non-tilted position of the sample, will, due to the loss of the symmetry of the immersion field, show a mix of these electrons when tilting the sample.The invention shows how, by biasing the stage with respect to the grounded electrodes closest to the sample, these disadvantages are eliminated, or at least reduced.

    Abstract translation: 本发明涉及一种配备有离子束柱和具有静电浸没透镜的电子束柱的双光束装置。 当倾斜样品时，静电浸没场失真，并且电子光轴周围的对称性丧失。 因此，倾斜引入有害影响，例如横向色差和光束位移。 在样品的非倾斜位置检测二次电子或后向散射电子的柱内检测器也将由于浸没场的对称性的损失而在倾斜样品时显示这些电子的混合物。 本发明示出了如何通过相对于最接近样品的接地电极偏置级来消除或至少减少这些缺点。

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