Invention Grant
US09056763B2 Stress buffer layer for integrated microelectromechanical systems (MEMS) 有权
用于集成微机电系统(MEMS)的应力缓冲层

Stress buffer layer for integrated microelectromechanical systems (MEMS)
Abstract:
Stress buffer layers for integrated microelectromechanical systems (MEMS) are described. For example, a semiconductor package includes a substrate having first and second surfaces, the second surface having an array of external conductive contacts. A microelectromechanical system (MEMS) component is disposed above the first surface of the substrate. A buffer layer is disposed above the MEMS component, the buffer layer having a first Young's modulus. A mold compound is disposed above the buffer layer, the mold compound having a second Young's modulus higher than the first Young's modulus.
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