发明授权
US09076636B2 Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method
有权
等离子体处理装置，等离子体处理方法和用于存储用于执行该方法的程序的存储介质
- 专利标题： Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method
- 专利标题（中）： 等离子体处理装置，等离子体处理方法和用于存储用于执行该方法的程序的存储介质
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申请号： US13232207申请日： 2011-09-14
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公开(公告)号： US09076636B2公开(公告)日： 2015-07-07
- 发明人: Mitsunori Ohata , Hidetoshi Kimura , Kiyoshi Maeda , Jun Hirose , Tsuyoshi Hida
- 申请人： Mitsunori Ohata , Hidetoshi Kimura , Kiyoshi Maeda , Jun Hirose , Tsuyoshi Hida
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 代理机构： Pearne & Gordon LLP
- 优先权： JP2010-206020 20100914
- 主分类号： C23C16/00
- IPC分类号： C23C16/00 ; H01L21/306 ; C23F1/00 ; H01J7/24 ; H05B31/26 ; H01J37/32 ; H01L21/67 ; H01L21/687
摘要：
There is provided a plasma processing apparatus including a susceptor 114, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring 210, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ring 214 having a top surface higher than a top surface of the substrate and an inner ring 212 extending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ring 220 positioned between the focus ring and the susceptor; a dielectric constant varying device 250 for varying a dielectric constant of the dielectric ring.
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