Invention Grant
US09076697B2 Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same
有权
光致抗蚀剂组合物，偏振片的制造方法以及使用其制造显示基板的方法
- Patent Title: Photoresist composition, method of manufacturing a polarizer and method of manufacturing a display substrate using the same
- Patent Title (中): 光致抗蚀剂组合物，偏振片的制造方法以及使用其制造显示基板的方法
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Application No.: US14453710Application Date: 2014-08-07
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Publication No.: US09076697B2Publication Date: 2015-07-07
- Inventor: Ki-Beom Lee , Dae-Hwan Jang , Atsushi Takakuwa
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR10-2012-0039496 20120417
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L27/12 ; G03F7/031 ; G03F7/075 ; G03F7/00 ; G02B1/12 ; G02B5/30 ; G02F1/1335
Abstract:
A photoresist composition includes about 65% by weight to about 80% by weight of a mono-functional monomer, about 5% by weight to about 20% by weight of a di-functional monomer, about 1% by weight to about 10% by weight of a multi-functional monomer including three or more functional groups, about 1% by weight to about 5% by weight of a photoinitiator, and less than about 1% by weight of a surfactant, each based on a total weight of the photoresist composition.
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