Invention Grant
- Patent Title: Interconnection structure for package and fabrication method thereof
- Patent Title (中): 封装的互连结构及其制造方法
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Application No.: US13894687Application Date: 2013-05-15
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Publication No.: US09076796B2Publication Date: 2015-07-07
- Inventor: Chun-Hung Lin , Chun-Hung Lu , Guang-Hwa Ma , Hsiao-Chun Huang , Kuang-Hsin Chen
- Applicant: Siliconware Precision Industries Co., Ltd.
- Applicant Address: TW Taichung
- Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee: Siliconware Precision Industries Co., Ltd.
- Current Assignee Address: TW Taichung
- Agency: Mintz Levin Cohn Ferris Glovsky & Popeo, P.C.
- Agent Peter F. Corless; Steven M. Jensen
- Priority: TW102104743A 20130207
- Main IPC: H01L23/532
- IPC: H01L23/532 ; H01L21/768 ; H01L23/498

Abstract:
An interconnection structure for a package is disclosed. The interconnection structure includes a substrate body having a conductive portion formed on a surface thereof; a first photosensitive dielectric layer formed on the surface of the substrate body and having a via for exposing the conductive potion; a conductive via formed in the via; a second photosensitive dielectric layer formed on the first photosensitive dielectric layer and having a opening for exposing the conductive via and a portion of the first photosensitive dielectric layer; and a conductive trace layer formed in the opening of the second photosensitive dielectric layer so as to be electrically connected to the conductive portion through the conductive via, thereby simplifying the fabrication process and reducing the fabrication cost and time.
Public/Granted literature
- US20140217605A1 INTERCONNECTION STRUCTURE FOR PACKAGE AND FABRICATION METHOD THEREOF Public/Granted day:2014-08-07
Information query
IPC分类: