Invention Grant
- Patent Title: Self aligned embedded gate carbon transistors
- Patent Title (中): 自对准嵌入式门极碳晶体管
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Application No.: US13969013Application Date: 2013-08-16
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Publication No.: US09087811B2Publication Date: 2015-07-21
- Inventor: Dechao Guo , Shu-Jen Han , Yu Lu , Keith Kwong Hon Wong
- Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Applicant Address: US NY Armonk
- Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
- Current Assignee Address: US NY Armonk
- Agency: Tutunjian & Bitetto, P.C.
- Agent Vazken Alexanian
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/417 ; H01L29/778 ; H01L29/16 ; H01L51/00 ; H01L51/05

Abstract:
Transistors with self-aligned source/drain regions a gate structure embedded in a substrate; self-aligned source and drain contacts embedded in the substrate around the gate structure; and a channel layer over the gate structure and self-aligned source and drain contacts. The source and drain contacts extend above the channel layer.
Public/Granted literature
- US20140312413A1 SELF ALIGNED EMBEDDED GATE CARBON TRANSISTORS Public/Granted day:2014-10-23
Information query
IPC分类: