Invention Grant
- Patent Title: Forming patterned graphene layers
- Patent Title (中): 形成图案化石墨烯层
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Application No.: US13310885Application Date: 2011-12-05
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Publication No.: US09102118B2Publication Date: 2015-08-11
- Inventor: Ali Afzali-Ardakani , Ahmed Maarouf , Glenn J. Martyna , Katherine Saenger
- Applicant: Ali Afzali-Ardakani , Ahmed Maarouf , Glenn J. Martyna , Katherine Saenger
- Applicant Address: US NY Armonk EG Cairo
- Assignee: International Business Machines Corporation,Egypt Nanotechnology Center (EGNC)
- Current Assignee: International Business Machines Corporation,Egypt Nanotechnology Center (EGNC)
- Current Assignee Address: US NY Armonk EG Cairo
- Agency: Ryan, Mason & Lewis, LLP
- Main IPC: B82Y30/00
- IPC: B82Y30/00 ; B82Y40/00 ; B32B3/00 ; C01B31/02 ; C23F1/02 ; H01B13/00 ; C01B31/04

Abstract:
An apparatus and method for forming a patterned graphene layer on a substrate. One such method includes forming at least one patterned structure of a carbide-forming metal or metal-containing alloy on a substrate, applying a layer of graphene on top of the at least one patterned structure of a carbide-forming metal or metal-containing alloy on the substrate, heating the layer of graphene on top of the at least one patterned structure of a carbide-forming metal or metal-containing alloy in an environment to remove graphene regions proximate to the at least one patterned structure of a carbide-forming metal or metal-containing alloy, and removing the at least one patterned structure of a carbide-forming metal or metal-containing alloy to produce a patterned graphene layer on the substrate, wherein the patterned graphene layer on the substrate provides carrier mobility for electronic devices.
Public/Granted literature
- US20130143000A1 Forming Patterned Graphene Layers Public/Granted day:2013-06-06
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