发明授权
- 专利标题: Crystalline silicon ingot and method of fabricating the same
- 专利标题(中): 结晶硅锭及其制造方法
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申请号: US13430131申请日: 2012-03-26
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公开(公告)号: US09133565B2公开(公告)日: 2015-09-15
- 发明人: Wen-Chieh Lan , Yong-Cheng Yu , Wen-Huai Yu , Sung-Lin Hsu , Wen-Ching Hsu
- 申请人: Wen-Chieh Lan , Yong-Cheng Yu , Wen-Huai Yu , Sung-Lin Hsu , Wen-Ching Hsu
- 申请人地址: TW Hsinchu
- 专利权人: Sino-American Silicon Products Inc.
- 当前专利权人: Sino-American Silicon Products Inc.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Osha Liang LLP
- 优先权: TW100137424A 20111014
- 主分类号: C30B11/02
- IPC分类号: C30B11/02 ; C30B11/14 ; C30B29/06 ; C30B11/00
摘要:
A crystalline silicon ingot and a method of manufacturing the same are provided. Using a crystalline silicon seed layer, the crystalline silicon ingot is formed by a directional solidification process. The crystalline silicon seed layer is formed of multiple primary monocrystalline silicon seeds and multiple secondary monocrystalline silicon seeds. Each of the primary monocrystalline silicon seeds has a first crystal orientation different from (100). Each of the secondary monocrystalline silicon seeds has a second crystal orientation different from the first crystal orientation. Each of the primary monocrystalline silicon seeds is adjacent to at least one of the secondary monocrystalline silicon seeds, and separate from the others of the primary monocrystalline silicon seeds.
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