Invention Grant
- Patent Title: Method of particle contaminant removal
- Patent Title (中): 颗粒污染物去除方法
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Application No.: US12485733Application Date: 2009-06-16
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Publication No.: US09159593B2Publication Date: 2015-10-13
- Inventor: Mark Naoshi Kawaguchi , David Mui , Mark Wilcoxson
- Applicant: Mark Naoshi Kawaguchi , David Mui , Mark Wilcoxson
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: B08B3/10
- IPC: B08B3/10 ; H01L21/67 ; H01L21/02 ; B08B7/00 ; C11D11/00 ; C11D17/04

Abstract:
Apparatus and methods for removing particle contaminants from a solid surface includes providing a layer of a viscoelastic material on the solid surface. The viscoelastic material is applied as a thin film and exhibits substantial liquid-like characteristics. The viscoelastic material at least partially binds with the particle contaminants. A high velocity liquid is applied to the viscoelastic material, such that the viscoelastic material exhibits solid-like behavior. The viscoelastic material is thus dislodged from the solid surface along with the particle contaminants, thereby cleaning the solid surface of the particle contaminants.
Public/Granted literature
- US20100313917A1 METHOD OF PARTICLE CONTAMINANT REMOVAL Public/Granted day:2010-12-16
Information query
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