Invention Grant
- Patent Title: Ink composition for imprint lithography and roll printing
- Patent Title (中): 用于压印光刻和辊印的油墨组合物
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Application No.: US14532186Application Date: 2014-11-04
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Publication No.: US09169409B2Publication Date: 2015-10-27
- Inventor: Sung-Hee Kim , Soon-Sung Yoo , Jin-Wuk Kim , Byung-Geol Kim , Byung-Uk Kim , Ki-Beom Lee , Byong-Hoo Kim , Seung-Hyup Shin , Jun-Yong Song , Myoung-Soo Lee
- Applicant: LG Display Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2008-0110624 20081107
- Main IPC: C09D11/00
- IPC: C09D11/00 ; C09D11/103 ; C08K5/134 ; C08K5/3492 ; C08K11/00 ; C08K5/05 ; B82Y10/00 ; B82Y40/00 ; C09D11/02 ; C09D11/033 ; G03F7/00

Abstract:
Disclosed are an ink composition for an imprint lithography and a roll printing, wherein in forming patterns of the LCD device using the imprint lithography and the roll printing, an ink composition with high thermal resistance, consisting of polymer resin and additive both endurable even at a high temperature is used to form fine patterns with constantly maintaining pattern linewidths and line intervals, and wherein the ink composition is endurable even at a high temperature of 90-250° C.
Public/Granted literature
- US20150133582A1 INK COMPOSITION FOR IMPRINT LITHOGRAPHY AND ROLL PRINTING Public/Granted day:2015-05-14
Information query
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