Invention Grant
US09176371B2 Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure
有权
具有在投影系统和液体限制结构之间的屏障的浸没式光刻设备
- Patent Title: Immersion lithographic apparatus with a barrier between a projection system and a liquid confinement structure
- Patent Title (中): 具有在投影系统和液体限制结构之间的屏障的浸没式光刻设备
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Application No.: US12559664Application Date: 2009-09-15
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Publication No.: US09176371B2Publication Date: 2015-11-03
- Inventor: Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
- Applicant: Jeroen Peter Johannes Bruijstens , Richard Joseph Bruls , Hans Jansen , Siebe Landheer , Laurentius Catrinus Jorritsma , Arnout Johannes Meester , Bauke Jansen , Ivo Adam Johannes Thomas , Marcio Alexandre Cano Miranda , Maurice Martinus Johannes Van Der Lee , Gheorghe Tanasa , Lambertus Dominicus Noordam
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03F7/20
Abstract:
A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.
Public/Granted literature
- US20100066987A1 LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS Public/Granted day:2010-03-18
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