Invention Grant
- Patent Title: Photoresist composition and method of manufacturing thin film transistor substrate using the same
- Patent Title (中): 光刻胶组合物和使用其制造薄膜晶体管基板的方法
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Application No.: US14531758Application Date: 2014-11-03
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Publication No.: US09176383B2Publication Date: 2015-11-03
- Inventor: Jeong-Won Kim , Ki-Hyun Cho , Kwang-Woo Park , Chul-Won Park , Jin-Ho Ju , Dong-Min Kim , Eun Jeagal
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2013-0132996 20131104
- Main IPC: G03F7/075
- IPC: G03F7/075 ; G03F7/039 ; G03F7/022 ; G03F7/30 ; G03F7/36 ; G03F7/42 ; H01L21/027 ; H01L27/12 ; H01L21/3213
Abstract:
A photoresist composition may include a novolac resin, a diazide-based photosensitive compound, a surfactant represented by Chemical Formula 1 below, and a solvent. R1 and R2 may denote a hydrogen atom or an alkyl group, x may be 10-50, and y may be 10-50.
Public/Granted literature
- US20150126005A1 PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING THIN FILM TRANSISTOR SUBSTRATE USING THE SAME Public/Granted day:2015-05-07
Information query
IPC分类:
