Invention Grant
US09182669B2 Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device
有权
具有酸不稳定基团的共聚物，光致抗蚀剂组合物，涂布基材和形成电子器件的方法
- Patent Title: Copolymer with acid-labile group, photoresist composition, coated substrate, and method of forming an electronic device
- Patent Title (中): 具有酸不稳定基团的共聚物，光致抗蚀剂组合物，涂布基材和形成电子器件的方法
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Application No.: US14527884Application Date: 2014-10-30
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Publication No.: US09182669B2Publication Date: 2015-11-10
- Inventor: Owendi Ongayi , Vipul Jain , James F. Cameron , James W. Thackeray , Suzanne Coley
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F220/30 ; G03F7/038
Abstract:
A copolymer includes repeat units derived from a lactone-substituted monomer, a base-soluble monomer having a pKa less than or equal to 12, a photoacid-generating monomer, and an acid-labile monomer having the formula wherein R1, R2, R3, and Ar are defined herein. The copolymer can be used as a component of a photoresist composition, and the photoresist composition can be coated on a substrate having one or more layers to be patterned, or used in a method of forming an electronic device.
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