公开(公告)号：US20170123316A1

公开(公告)日：2017-05-04

申请号：US15297526

申请日：2016-10-19

Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

Inventor： Huaxing Zhou ,  Vipul Jain ,  Jin Wuk Sung ,  Peter Trefonas, III ,  Phillip D. Hustad ,  Mingqi Li

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20 ,  G03F7/004 ,  C08F293/00

CPC classification number: G03F7/038 ,  B81C2201/0149 ,  C08F293/00 ,  C08F293/005 ,  C08F2438/03 ,  C08L53/00 ,  C09D153/00 ,  C09D183/10 ,  G03F7/0045 ,  G03F7/11 ,  G03F7/162 ,  G03F7/165 ,  G03F7/168 ,  G03F7/2004 ,  G03F7/325 ,  G03F7/40 ,  H01L21/0274 ,  H01L21/31144

Abstract: Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.

公开(公告)号：US09606434B2

公开(公告)日：2017-03-28

申请号：US14833273

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Paul J. LaBeaume ,  Vipul Jain ,  James W. Thackeray ,  James F. Cameron ,  Suzanne M. Coley ,  Amy M. Kwok ,  David A. Valeri

IPC: G03F7/039 ,  C08F228/02 ,  G03F7/004

CPC classification number: G03F7/0045 ,  C08F228/02 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397

Abstract: A polymer includes repeat units, most of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. Each of the photoacid-generating repeat units comprises an anion and a photoacid-generating cation that collectively have structure (I) wherein q, r, R1, m, X, and Z− are defined herein. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

公开(公告)号：US09500947B2

公开(公告)日：2016-11-22

申请号：US14027349

申请日：2013-09-16

Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

Inventor： Paul J. LaBeaume ,  Aaron A. Rachford ,  Vipul Jain

IPC: G03F7/004 ,  C07C381/12 ,  G03F7/20 ,  G03F7/038 ,  G03F7/039

CPC classification number: G03F7/0045 ,  C07C381/12 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/20

Abstract: Acid generator compounds are provided that are particularly useful as a photoresist composition component. Acid generator compounds of the invention comprise 1) a cyclic sulfonium salt and 2) a covalently linked photoacid-labile group. In one aspect, thioxanthone acid generator compounds are particularly preferred, including acid generator compounds that comprise (i) a thioxanthone moiety; and (ii) one or more covalently linked acid labile-groups.

Abstract translation: 提供了特别可用作光致抗蚀剂组合物组分的酸发生剂化合物。 本发明的酸产生剂化合物包括1）环状锍盐和2）共价连接的光致酸不稳定基团。 一方面，特别优选噻吨酮酸发生剂化合物，包括含有（i）噻吨酮部分的酸产生剂化合物; 和（ii）一个或多个共价连接的酸不稳定基团。

公开(公告)号：US09469705B2

公开(公告)日：2016-10-18

申请号：US14833245

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Vipul Jain ,  Paul J. LaBeaume ,  James W. Thackeray ,  James F. Cameron ,  Suzanne M. Coley ,  Amy M. Kwok ,  David A. Valeri

IPC: G03F7/004 ,  C08F22/10 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/039 ,  G03F7/20 ,  G03F7/38 ,  H01L21/027

Abstract: A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.

公开(公告)号：US20160103391A1

公开(公告)日：2016-04-14

申请号：US14833278

申请日：2015-08-24

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Paul J. LaBeaume ,  Vipul Jain ,  Suzanne M. Coley ,  James W. Thackeray ,  James F. Cameron ,  Amy M. Kwok ,  David A. Valeri

IPC: G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/038 ,  C07C309/12 ,  C07C381/12 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  C08F220/38 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  H01L21/0274

Abstract: A photoresist composition includes a first polymer in which at least half of the repeat units are photoacid-generating repeat units, and a second polymer that exhibits a change in solubility in an alkali developer under the action of acid. In the first polymer, each of the photoacid-generating repeat units comprises photoacid-generating functionality and base-solubility-enhancing functionality.

Abstract translation: 光致抗蚀剂组合物包括其中至少一半的重复单元是产生光酸的重复单元的第一聚合物和在酸性作用下在碱性显影剂中显示出溶解度变化的第二聚合物。 在第一聚合物中，每个产生光酸的重复单元包括产生光酸的功能和碱溶性增强功能。

公开(公告)号：US20160002199A1

公开(公告)日：2016-01-07

申请号：US14611768

申请日：2015-02-02

Applicant: Rohm and Haas Electronic Materials, LLC

Inventor： James F. Cameron ,  Vipul Jain ,  Paul J. Labeaume ,  Jin Wuk Sung ,  James W. Thackeray

IPC: C07D333/76 ,  C07C309/17 ,  G03F7/20 ,  G03F7/32 ,  G03F7/004 ,  G03F7/16

CPC classification number: C07D333/76 ,  C07C309/17 ,  C07C315/00 ,  C07C2603/86 ,  C07D333/46 ,  C08F12/30 ,  C08F220/24 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/20 ,  G03F7/2004 ,  G03F7/2059 ,  G03F7/32

Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

Abstract translation: 提供了特别可用作光致抗蚀剂组合物组分的酸发生剂化合物。 优选的酸产生剂包括包含共价连接的酸不稳定基团的环状锍化合物。

公开(公告)号：US20150177615A1

公开(公告)日：2015-06-25

申请号：US14528096

申请日：2014-10-30

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Vipul Jain ,  Owendi Ongayi ,  James W. Thackeray ,  James F. Cameron

IPC: G03F7/038 ,  C08F224/00

CPC classification number: G03F7/004 ,  C08F220/30 ,  C08F224/00 ,  C09D133/06 ,  C09D133/14 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  C08F2220/303 ,  C08F2220/302 ,  C08F2220/382

Abstract: A copolymer include repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl (meth)acrylate in which the C1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R1, R2, R3, X, m, and R5 are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.

Abstract translation: 共聚物包括衍生自酸不稳定单体，含脂肪族内酯的单体，C1-12烷基（甲基）丙烯酸酯的重复单元，其中C1-12烷基包括特定的碱溶性基团，光产酸单体 其包括脂族阴离子和具有下式的中性芳族单体：其中R1，R2，R3，X，m和R5如本文所定义。 共聚物用作光致抗蚀剂组合物的组分。 描述了包括光致抗蚀剂组合物层的涂覆基材，以及使用该涂布基板形成电子器件的方法。

公开(公告)号：US08936900B2

公开(公告)日：2015-01-20

申请号：US13624579

申请日：2012-09-21

Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

Inventor： Vipul Jain ,  D. Patrick Green ,  James W. Thackeray ,  Brad C. Bailey ,  Su Jin Kang

IPC: G03F7/004 ,  C07C43/02 ,  C07C309/00

CPC classification number: C07C67/29 ,  C07C69/76 ,  G03F7/0392

Abstract: A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R1)2═C(R2)—O-(L)n-Ar1, and a calix[4]arene, wherein R1 and R2 are each independently a single bond, H, C1-20 alkyl, C1-20 haloalkyl, C6-20 aryl, C6-20 haloaryl, C7-20 aralkyl, or C7-20 haloaralkyl, L is a C1-20 linking group, n is 0 or 1, and Ar1 is a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic C6-20 aromatic-containing moiety, wherein R1 and R2 are connected to Ar1 when either or both of R1 and R2 is a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.

Abstract translation: 分子玻璃化合物包括式C（R 1）2 = C（R 2）-O-（L）n -Ar 1的芳族乙烯基醚和杯[4]芳烃的乙烯基醚加合物，其中R 1和R 2各自 独立地单键，H，C 1-20烷基，C 1-20卤代烷基，C 6-20芳基，C 6-20卤代芳基，C 7-20芳烷基或C 7-20卤代烷基，L是C 1-20连接基团，n是0 或1，并且Ar 1是含卤素的单环或取代或未取代的多环或稠合多环C 6-20芳族部分，其中当R 1和R 2中的任一个或两个为单键时，R 1和R 2连接到Ar 1，n 包括分子玻璃化合物，溶剂和光致酸产生剂的涂覆基材，包括（a）在其表面上具有待图案化的一层或多层的基材; 和（b）一层或多层待图案化的光致抗蚀剂组合物层，以及形成分子玻璃化合物的方法。

公开(公告)号：US10481494B1

公开(公告)日：2019-11-19

申请号：US14635553

申请日：2015-03-02

Applicant: Rohm and Haas Electronic Materials LLC

Inventor： Vipul Jain ,  Owendi Ongayi ,  Suzanne Coley ,  Anthony Zampini

IPC: G03F7/09 ,  G03F7/11 ,  G03F7/039 ,  G03F7/30 ,  G03F7/32

Abstract: Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a component that comprises one or more parabanic acid moieties. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

公开(公告)号：US10042255B2

公开(公告)日：2018-08-07

申请号：US15297526

申请日：2016-10-19

Applicant: Rohm and Haas Electronic Materials LLC ,  Dow Global Technologies LLC

Inventor： Huaxing Zhou ,  Vipul Jain ,  Jin Wuk Sung ,  Peter Trefonas, III ,  Phillip D. Hustad ,  Mingqi Li

IPC: G03F7/004 ,  G03F7/038 ,  C09D183/10 ,  G03F7/40 ,  G03F7/11 ,  G03F7/16 ,  C08L53/00 ,  C09D153/00 ,  H01L21/027 ,  H01L21/311 ,  C08F293/00 ,  G03F7/20 ,  G03F7/32

Abstract: Block copolymers comprise a first block comprising an alternating copolymer, and a second block comprising a unit comprising a hydrogen acceptor. The block copolymers find particular use in pattern shrink compositions and methods in semiconductor device manufacture for the provision of high resolution patterns.