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US09209184B2 High-integration semiconductor device and method for fabricating the same 有权
高集成半导体器件及其制造方法

High-integration semiconductor device and method for fabricating the same
Abstract:
A semiconductor device includes a substrate including a first active region, a second active region and a field region between the first and second active regions, and a gate structure formed on the substrate to cross the first active region, the second active region and the field region. The gate structure includes a p type metal gate electrode and an n-type metal gate electrode directly contacting each other, the p-type metal gate electrode extends from the first active region less than half way toward the second active region.
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