Invention Grant
- Patent Title: Fluorine-containing polymer, purification method, and radiation-sensitive resin composition
- Patent Title (中): 含氟聚合物，净化方法和辐射敏感树脂组合物
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Application No.: US14178622Application Date: 2014-02-12
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Publication No.: US09213236B2Publication Date: 2015-12-15
- Inventor: Hiroki Nakagawa , Hiromitsu Nakashima , Gouji Wakamatsu , Kentarou Gotou , Yukio Nishimura , Takeo Shioya
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-099889 20060331; JP2006-165310 20060614; JP2006-247299 20060912; JP2007-010765 20070119
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/004 ; C08F220/18 ; C08F220/24 ; C08F220/28 ; G03F7/20
Abstract:
A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70° or more.
Public/Granted literature
- US20140162190A1 FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION Public/Granted day:2014-06-12
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