公开(公告)号：US11003079B2

公开(公告)日：2021-05-11

申请号：US16205502

申请日：2018-11-30

Applicant: JSR CORPORATION

Inventor： Naoya Nosaka ,  Gouji Wakamatsu ,  Tsubasa Abe ,  Yuushi Matsumura ,  Masayuki Miyake ,  Yoshio Takimoto

IPC: G03F7/00 ,  G03F7/11 ,  G03F7/26 ,  G03F7/09 ,  C08F34/02 ,  C09D161/12 ,  C08G8/20 ,  C07D311/74 ,  C07D311/92 ,  C07D405/14 ,  C08G61/10 ,  C09D165/00 ,  H01L21/027 ,  C08J5/18

Abstract: The composition for film formation includes a compound including a group of the formula (1) and a solvent. In the formula (1), R1 to R4 each independently represent a hydrogen atom, a monovalent organic group having 1 to 20 carbon atoms, or R1 to R4 taken together represent a cyclic structure having 3 to 20 ring atoms together with the carbon atom or a carbon chain to which R1 to R4 bond. Ar1 represents a group obtained by removing (n+3) hydrogen atoms from an aromatic ring of an arene having 6 to 20 carbon atoms. n is an integer of 0 to 9. R5 represents a hydroxy group, a halogen atom, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms.

公开(公告)号：US20210286267A1

公开(公告)日：2021-09-16

申请号：US17331757

申请日：2021-05-27

Applicant: JSR CORPORATION

Inventor： Tsubasa Abe ,  Gouji Wakamatsu

IPC: G03F7/11 ,  C08G8/24 ,  C09D161/06 ,  C08G8/20 ,  C09D161/12 ,  C08F212/32 ,  C09D125/02 ,  C08F220/22 ,  C09D133/16

Abstract: A composition contains: an aromatic ring-containing compound; a fluorine atom-containing polymer; and an organic solvent. The fluorine atom-containing polymer has: a first structural unit represented by formula (1); and a second structural unit represented by formula (2). In the formula (1), R1 represents a fluorine atom-containing monovalent organic group having 1 to 20 carbon atoms; and R2 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. In the formula (2), R3 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; and R4 represents a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms.

公开(公告)号：US10082733B2

公开(公告)日：2018-09-25

申请号：US15299871

申请日：2016-10-21

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/04 ,  G03F7/039 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US09696626B2

公开(公告)日：2017-07-04

申请号：US15159054

申请日：2016-05-19

Applicant: JSR CORPORATION

Inventor： Fumihiro Toyokawa ,  Shin-ya Nakafuji ,  Gouji Wakamatsu

IPC: G03F7/004 ,  G03F7/11 ,  C07C279/08 ,  C07C217/18 ,  G03F7/26 ,  G03F7/40 ,  G03F7/09 ,  H01L21/02 ,  H01L21/027 ,  H01L21/306 ,  H01L21/308 ,  C08G8/04 ,  C08G8/20 ,  C08L61/06 ,  H01L21/3065 ,  H01L21/3105

CPC classification number: G03F7/11 ,  C07C217/18 ,  C07C279/08 ,  C07C2603/92 ,  C08G8/04 ,  C08G8/20 ,  C08L61/06 ,  G03F7/094 ,  G03F7/26 ,  G03F7/40 ,  H01L21/02057 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31058 ,  C08L61/12

Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.

公开(公告)号：US09500950B2

公开(公告)日：2016-11-22

申请号：US14933641

申请日：2015-11-05

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract translation: 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。

公开(公告)号：US09029067B2

公开(公告)日：2015-05-12

申请号：US14487894

申请日：2014-09-16

Applicant: JSR Corporation

Inventor： Gouji Wakamatsu ,  Masafumi Hori ,  Kouichi Fujiwara ,  Makoto Sugiura

IPC: G03F7/004 ,  G03F7/20 ,  G03F7/40 ,  G03F7/00 ,  G03F7/039 ,  H01L21/027

CPC classification number: G03F7/40 ,  G03F7/0035 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2024 ,  H01L21/0273

Abstract: A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), wherein for example, R1 represents a hydrogen atom, A represents a methylene group, R2 represents a group shown by a following formula (2-1) or a group shown by a following formula (2-2), R3 represents a methylene group, R4 represents a hydrogen atom, and n is 0 or 1, wherein each of R34 represents at least one of a hydrogen atom and a linear or branched alkyl group having 1 to 10 carbon atoms.

Abstract translation: 抗蚀剂图案不溶化树脂组合物用于抗蚀剂图案形成方法。 抗蚀剂图案不溶化树脂组合物包括溶剂和树脂。 树脂包括在其侧链中包含羟基的第一重复单元和由下式（1-1）所示的单体衍生的第二重复单元和由下式表示的单体衍生的第三重复单元中的至少一种： 下述式（1-2）表示的基团，其中，例如，R1表示氢原子，A表示亚甲基，R2表示下述式（2-1）所示的基团或下述式（2- 2）中，R3表示亚甲基，R4表示氢原子，n表示0或1，R34表示氢原子和碳原子数1〜10的直链或支链烷基中的至少一种。

公开(公告)号：US11036133B2

公开(公告)日：2021-06-15

申请号：US16720409

申请日：2019-12-19

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US10146131B2

公开(公告)日：2018-12-04

申请号：US14862352

申请日：2015-09-23

Applicant: JSR CORPORATION

Inventor： Shin-ya Nakafuji ,  Fumihiro Toyokawa ,  Gouji Wakamatsu ,  Yoshio Takimoto ,  Katsuhisa Mizoguchi ,  Takashi Okada ,  Takaaki Uno ,  Takeshi Endo ,  Masaki Moritsugu

IPC: G03F7/11 ,  C07D493/10 ,  C08G65/40 ,  C07C255/54 ,  C08G65/38 ,  C09D171/00 ,  G03F7/16 ,  G03F7/36 ,  H01L21/02 ,  C09D171/10 ,  G03F7/09

Abstract: A composition includes a compound including a partial structure represented by formula (1), and solvent. In the formula (1), X1 and X2 each independently represent a substituted or unsubstituted ring structure having 4 to 10 ring atoms constituted taken together with the spiro carbon atom and the carbon atoms of the aromatic ring adjacent to X1 or X2; n1 and n2 are each independently an integer of 0 to 2; and the sum of k1 and k2 are each independently an integer of 1 to 8, wherein the sum of k1 and k2 is no less than 2 and no greater than 16. The compound is preferably represented by formula (2). The sum of k1 and k2 in the formula (1) is preferably no less than 3.

公开(公告)号：US09400429B2

公开(公告)日：2016-07-26

申请号：US14642857

申请日：2015-03-10

Applicant: JSR CORPORATION

Inventor： Fumihiro Toyokawa ,  Shin-ya Nakafuji ,  Gouji Wakamatsu

IPC: G03F7/004 ,  G03F7/11 ,  C07C279/08 ,  C07C217/18 ,  G03F7/26 ,  G03F7/09 ,  H01L21/02 ,  H01L21/027 ,  H01L21/306 ,  H01L21/308 ,  C08G8/04 ,  C08G8/20 ,  C08L61/06

CPC classification number: G03F7/11 ,  C07C217/18 ,  C07C279/08 ,  C07C2603/92 ,  C08G8/04 ,  C08G8/20 ,  C08L61/06 ,  G03F7/094 ,  G03F7/26 ,  G03F7/40 ,  H01L21/02057 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31058 ,  C08L61/12

Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.

Abstract translation: 提供了一种用于形成抗蚀剂下层膜的组合物，其包含：由杯芳烃获得的杯芳烃类化合物，其通过用杯芳烃中的酚羟基取代至少一部分氢原子， 30个碳原子; 和有机溶剂。 一价有机基团优选包括可交联基团。 杯芳烃类化合物的酚羟基上的氢原子的一部分优选被取代。 取代酚羟基数与杯芳烃类化合物中未取代的酚羟基数之比优选不小于30/70且不大于99/1。

公开(公告)号：US20150185613A1

公开(公告)日：2015-07-02

申请号：US14642857

申请日：2015-03-10

Applicant: JSR CORPORATION

Inventor： Fumihiro TOYOKAWA ,  Shin-ya Nakafuji ,  Gouji Wakamatsu

IPC: G03F7/11 ,  H01L21/027 ,  H01L21/02 ,  H01L21/306 ,  H01L21/308

CPC classification number: G03F7/11 ,  C07C217/18 ,  C07C279/08 ,  C07C2603/92 ,  C08G8/04 ,  C08G8/20 ,  C08L61/06 ,  G03F7/094 ,  G03F7/26 ,  G03F7/40 ,  H01L21/02057 ,  H01L21/0273 ,  H01L21/0274 ,  H01L21/30604 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/31058 ,  C08L61/12

Abstract: A composition for forming a resist underlayer film is provided, which contains: a calixarene-based compound obtained from a calixarene by substituting at least a part of hydrogen atoms each on phenolic hydroxyl groups comprised in the calixarene, with a monovalent organic group having 1 to 30 carbon atoms; and an organic solvent. The monovalent organic group preferably includes a crosslinkable group. A part of hydrogen atoms each on phenolic hydroxyl groups of the calixarene-based compound is preferably substituted. The ratio of the number of substituted phenolic hydroxyl groups to the number of unsubstituted phenolic hydroxyl groups in the calixarene-based compound is preferably no less than 30/70 and no greater than 99/1.

Abstract translation: 提供了一种用于形成抗蚀剂下层膜的组合物，其包含：由杯芳烃获得的杯芳烃类化合物，其通过用杯芳烃中的酚羟基取代至少一部分氢原子， 30个碳原子; 和有机溶剂。 一价有机基团优选包括可交联基团。 杯芳烃类化合物的酚羟基上的氢原子的一部分优选被取代。 取代酚羟基数与杯芳烃类化合物中未取代的酚羟基数之比优选不小于30/70且不大于99/1。