公开(公告)号：US11036133B2

公开(公告)日：2021-06-15

申请号：US16720409

申请日：2019-12-19

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/004 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/039 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US11681222B2

公开(公告)日：2023-06-20

申请号：US17320640

申请日：2021-05-14

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/004 ,  C08F220/24 ,  G03F7/039 ,  C08F220/18 ,  C08F220/28 ,  G03F7/20 ,  G03F7/16 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/1807 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40 ,  C08F220/283

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US20170199453A1

公开(公告)日：2017-07-13

申请号：US15299871

申请日：2016-10-21

Applicant: JSR CORPORATION

Inventor： Hiroki NAKAGAWA ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/004 ,  G03F7/16 ,  G03F7/40 ,  G03F7/32 ,  G03F7/38 ,  G03F7/039 ,  G03F7/20

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US09213236B2

公开(公告)日：2015-12-15

申请号：US14178622

申请日：2014-02-12

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/039 ,  G03F7/004 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/20

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: A fluorine-containing polymer for use in a radiation-sensitive resin composition is used for forming a photoresist film in a process of forming a resist pattern, including a liquid immersion lithographic process in which radiation is emitted through a liquid having a refractive index larger than the refractive index of air at a wavelength of 193 nm, and being present between a lens and the photoresist film. The fluorine-containing polymer has a weight average molecular weight determined by gel permeation chromatography in the range from 1,000 to 50,000 and a receding contact angle with water and the photoresist film formed therefrom is 70° or more.

Abstract translation: 用于辐射敏感性树脂组合物的含氟聚合物用于在形成抗蚀剂图案的工艺中形成光致抗蚀剂膜，包括液浸光刻工艺，其中通过折射率大于 波长为193nm的空气的折射率，并且存在于透镜和光致抗蚀剂膜之间。 含氟聚合物的重均分子量通过凝胶渗透色谱法测定为1000〜50,000，与水的后退接触角和由其形成的光致抗蚀剂膜为70°以上。

公开(公告)号：US10082733B2

公开(公告)日：2018-09-25

申请号：US15299871

申请日：2016-10-21

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/04 ,  G03F7/039 ,  G03F7/004 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

公开(公告)号：US09500950B2

公开(公告)日：2016-11-22

申请号：US14933641

申请日：2015-11-05

Applicant: JSR CORPORATION

Inventor： Hiroki Nakagawa ,  Hiromitsu Nakashima ,  Gouji Wakamatsu ,  Kentarou Gotou ,  Yukio Nishimura ,  Takeo Shioya

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/004 ,  G03F7/20

CPC classification number: G03F7/0046 ,  C08F220/18 ,  C08F220/24 ,  C08F220/28 ,  G03F7/0045 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2006 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

Abstract: An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid for liquid immersion lithography such as water that comes in contact with the resist during exposure in liquid immersion lithography is little, and which provides a larger receding contact angle between the resist film and the liquid for liquid immersion lithography such as water, and a method for purifying the fluorine-containing polymer. The present resin composition comprises a novel fluorine-containing polymer (A) containing repeating units represented by the general formulae (1) and (2) and having Mw of 1,000-50,000, a resin (B) having an acid-unstable group, a radiation-sensitive acid generator (C), a nitrogen-containing compound (D) and a solvent (E).

Abstract translation: 本发明的目的是提供一种含氟聚合物，其含有含氟聚合物的液浸光刻用的辐射敏感性树脂组合物，其导致具有优异形状和优异的焦深的图案，其中 在液浸光刻中曝光期间与抗蚀剂接触的液体浸液式液晶等液体中的洗脱组分的量很少，并且在抗蚀剂膜和用于液浸的液体之间提供较大的后退接触角 光刻法如水，以及纯化含氟聚合物的方法。 本发明的树脂组合物包含含有由通式（1）和（2）表示的重复单元并具有1,000-50,000的Mw的新的含氟聚合物（A），具有酸不稳定基团的树脂（B）， 辐射敏感性酸产生剂（C），含氮化合物（D）和溶剂（E）。