Invention Grant
- Patent Title: Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices
- Patent Title (中): 感光树脂组合物，固化膜的制备方法，所得固化膜，有机EL显示装置和液晶显示装置
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Application No.: US14607644Application Date: 2015-01-28
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Publication No.: US09223211B2Publication Date: 2015-12-29
- Inventor: Kyouhei Sakita , Shinji Fujimoto , Mikio Nakagawa , Kenta Yamazaki
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-168441 20120730; JP2012-238613 20121030; JP2013-053262 20130315
- Main IPC: C07D277/84
- IPC: C07D277/84 ; C07D277/64 ; C07D417/12 ; C07D263/56 ; C07D263/60 ; G03F7/027 ; C08F12/22 ; C08F20/26 ; G03F7/40 ; G03F7/004 ; G03F7/039 ; H05B33/22 ; H01L27/32
Abstract:
Provided is a photosensitive resin composition having high sensitivity and storage stability. The photosensitive resin composition comprises (A) a polymer component including a polymer satisfying at least one of (1) and (2) below: (1) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and (a2) a structural unit containing a crosslinkable group, and (2) a polymer comprising (a1) a structural unit containing a group in which an acid group is protected by an acid-dissociable group, and a polymer comprising (a2) a structural unit containing a crosslinkable group; (B) a compound represented by formula (I) below; and (C) a solvent;
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