Invention Grant
- Patent Title: Low voltage photodetectors
- Patent Title (中): 低压光电探测器
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Application No.: US14129181Application Date: 2013-08-02
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Publication No.: US09224882B2Publication Date: 2015-12-29
- Inventor: Yun-Chung Na , Han-Din Liu , Yimin Kang , Shu-Lu Chen
- Applicant: Intel Corporation
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Green, Howard & Mughal LLP
- International Application: PCT/US2013/053443 WO 20130802
- International Announcement: WO2015/016942 WO 20150205
- Main IPC: H04B10/06
- IPC: H04B10/06 ; H01L31/0216 ; H01L31/107 ; H01L31/0224 ; H01L31/028 ; H01L31/0232 ; H01L31/108 ; H01L31/18 ; H04B10/60

Abstract:
A low voltage photodetector structure including a semiconductor device layer, which may be Ge, is disposed over a substrate semiconductor, which may be Si, for example within a portion of a waveguide extending laterally within a photonic integrated circuit (PIC) chip. In exemplary embodiments where the device layer is formed over an insulator layer, the insulator layer is removed to expose a surface of the semiconductor device layer and a passivation material formed as a replacement for the insulator layer within high field regions. In further embodiments, controlled avalanche gain is achieved by spacing electrodes in a metal-semiconductor-metal (MSM) architecture, or complementary doped regions in a p-i-n architecture, to provide a field strength sufficient for impact ionization over a distance not significantly more than an order of magnitude greater than the distance that a carrier must travel so as to acquire sufficient energy for impact ionization.
Public/Granted literature
- US20150037048A1 LOW VOLTAGE PHOTODETECTORS Public/Granted day:2015-02-05
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