Invention Grant
US09229319B2 Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
有权
产生光生酸的共聚物和相关的光致抗蚀剂组合物，涂覆的基底，以及形成电子器件的方法
- Patent Title: Photoacid-generating copolymer and associated photoresist composition, coated substrate, and method of forming an electronic device
- Patent Title (中): 产生光生酸的共聚物和相关的光致抗蚀剂组合物，涂覆的基底，以及形成电子器件的方法
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Application No.: US14527961Application Date: 2014-10-30
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Publication No.: US09229319B2Publication Date: 2016-01-05
- Inventor: Vipul Jain , Owendi Ongayi , James W. Thackeray , James F. Cameron
- Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Applicant Address: US MA Marlborough
- Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
- Current Assignee Address: US MA Marlborough
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F220/22 ; C08F220/30 ; G03F7/20 ; G03F7/004 ; C08F220/28
Abstract:
A copolymer include repeat units derived from an acid-labile monomer, an aliphatic lactone-containing monomer, a C1-12 alkyl(meth)acrylate in which the C1-12 alkyl group includes a specific base-soluble group, a photoacid-generating monomer that includes an aliphatic anion, and a neutral aromatic monomer having the formula wherein R1, R2, R3, X, m, and Ar are defined herein. The copolymer is used as a component of a photoresist composition. A coated substrate including a layer of the photoresist composition, and a method of forming an electronic device using the coated substrate are described.
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