Invention Grant
- Patent Title: Field effect transistor devices
- Patent Title (中): 场效应晶体管器件
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Application No.: US14277134Application Date: 2014-05-14
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Publication No.: US09236473B2Publication Date: 2016-01-12
- Inventor: Roy E. Meade , Gurtej S. Sandhu
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John, P.S.
- Main IPC: G11C11/22
- IPC: G11C11/22 ; H01L29/78 ; G11C11/56 ; G11C13/00 ; H01L21/28 ; H01L49/02 ; H01L29/792 ; H01L27/06

Abstract:
A memcapacitor device includes a pair of opposing conductive electrodes. A semiconductive material including mobile dopants within a dielectric and a mobile dopant barrier dielectric material are received between the pair of opposing conductive electrodes. The semiconductive material and the barrier dielectric material are of different composition relative one another which is at least characterized by at least one different atomic element. One of the semiconductive material and the barrier dielectric material is closer to one of the pair of electrodes than is the other of the semiconductive material and the barrier dielectric material. The other of the semiconductive material and the barrier dielectric material is closer to the other of the pair of electrodes than is the one of the semiconductive material and the barrier dielectric material. Other implementations are disclosed, including field effect transistors, memory arrays, and methods.
Public/Granted literature
- US20140246671A1 Field Effect Transistor Devices Public/Granted day:2014-09-04
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